SCHEMBL5162317

SCHEMBL5162317

O=C(O)c1cc(=O)n(-c2ccc(S(=O)(=O)O)cc2S(=O)(=O)O)[nH]1

nearest known ligand 0.46

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ ALKBH5 Q6P6C2 17/20 0.46
▸ KDM4E B2RXH2 2/20 0.37
▸ ALDH1A1 P00352 2/20 0.37
▸ HPGD P15428 1/20 0.37
▸ HSD17B10 Q99714 1/20 0.37
▸ LCK P06239 1/20 0.36
▸ FYN P06241 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1939982 0.92 ALKBH5 (0.46) ALKBH5KDM4EALDH1A1HPGDHSD17B10
SCHEMBL5162071 0.88 ALDH1A1 (0.37) ALKBH5KDM4EALDH1A1
SCHEMBL7830050 0.85 ALKBH5 (0.45) ALKBH5KDM4EALDH1A1HSD17B10
SCHEMBL7890140 0.85 ALKBH5 (0.52) ALKBH5KDM4EALDH1A1HPGDHSD17B10
SCHEMBL5157497 0.85 ALKBH5 (0.37) ALKBH5KDM4EALDH1A1
SCHEMBL693607 0.83 ALKBH5 (0.48) ALKBH5
SCHEMBL1266657 0.83 ALKBH5 (0.51) ALKBH5KDM4EALDH1A1HPGDHSD17B10
SCHEMBL7890932 0.82 ALKBH5 (0.49) ALKBH5KDM4EALDH1A1
SCHEMBL5159217 0.82 ALDH1A1 (0.58) KDM4EALDH1A1HPGD
SCHEMBL696836 0.81 ALDH1A1 (0.46) KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1473330-B1 Process for the synthesis of oxonol compound FUJI PHOTO FILM CO LTD (JP) 2007-02-14 — — EP disclosed
EP-0819977-B1 Oxonol compound and silver halide photographic material FUJI PHOTO FILM CO LTD (JP) 2006-01-04 — — EP disclosed
EP-1473330-A1 Process for the synthesis of oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 2004-11-03 — — EP disclosed
US-6159673-A Oxonol compound, light-sensitive material and process for the synthesis of oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 2000-12-12 — — US disclosed
EP-0819977-A1 Oxonol compound, silver halide photographic material and process for the synthesis of oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 1998-01-21 — — EP disclosed
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