SCHEMBL5162071

SCHEMBL5162071

CC(=O)c1cc(=O)n(-c2ccc(S(=O)(=O)O)cc2S(=O)(=O)O)[nH]1

nearest known ligand 0.37

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 1/20 0.37
ALKBH5 Q6P6C2 12/20 0.35
MAPT P10636 2/20 0.34
LMNA P02545 1/20 0.34
GAA P10253 1/20 0.34
CASP6 P55212 2/20 0.33
ATIC P31939 1/20 0.33
KMT2A Q03164 1/20 0.33
TIMP3 P35625 1/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA14 Q9ULX7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5162317 0.88 ALKBH5 (0.46) ALDH1A1KDM4EALKBH5
SCHEMBL5157497 0.86 ALKBH5 (0.37) ALDH1A1KDM4EALKBH5MAPTLMNA
SCHEMBL5159217 0.83 ALDH1A1 (0.58) ALDH1A1KDM4EMAPTLMNAGAA
SCHEMBL696836 0.82 ALDH1A1 (0.46) ALDH1A1KDM4EMAPTLMNAGAA
SCHEMBL1939982 0.80 ALKBH5 (0.46) ALDH1A1KDM4EALKBH5
SCHEMBL7890140 0.76 ALKBH5 (0.52) ALDH1A1KDM4EALKBH5MAPTLMNA
SCHEMBL11517773 0.75 MEN1 (0.45) ALDH1A1KDM4EMAPTLMNAGAA
SCHEMBL11657290 0.74 KDM5A (0.36) ALDH1A1KDM4EMAPTLMNAGAA
SCHEMBL11657301 0.74 KDM5A (0.36) ALDH1A1KDM4EMAPTLMNAGAA
SCHEMBL5447378 0.74 MAPT (0.46) ALDH1A1KDM4EMAPTLMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1473330-B1 Process for the synthesis of oxonol compound FUJI PHOTO FILM CO LTD (JP) 2007-02-14 EP disclosed
EP-0819977-B1 Oxonol compound and silver halide photographic material FUJI PHOTO FILM CO LTD (JP) 2006-01-04 EP disclosed
EP-1473330-A1 Process for the synthesis of oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 2004-11-03 EP disclosed
US-6159673-A Oxonol compound, light-sensitive material and process for the synthesis of oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 2000-12-12 US disclosed
EP-0819977-A1 Oxonol compound, silver halide photographic material and process for the synthesis of oxonol compound FUJI PHOTO FILM CO., LTD. (JP) 1998-01-21 EP disclosed