Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | CRHBP | P24387 | 2/20 | 0.37 |
| ▸ | CRHR2 | Q13324 | 2/20 | 0.37 |
| ▸ | TLR9 | Q9NR96 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | FBP1 | P09467 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.34 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.34 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6825300 | 0.82 | ATM (0.42) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL8925970 | 0.82 | ALDH1A1 (0.41) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL175271 | 0.77 | ALDH1A1 (0.44) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL28950933 | 0.77 | NPSR1 (0.48) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL16236160 | 0.75 | ALDH1A1 (0.45) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL11137782 | 0.75 | MTNR1A (0.39) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL10874786 | 0.75 | ATM (0.38) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL4373512 | 0.74 | ALDH1A1 (0.41) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL4737917 | 0.74 | ALDH1A1 (0.41) | ATMALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL16236159 | 0.74 | ALDH1A1 (0.41) | ATMALDH1A1SMN1; SMN2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 271 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6423458-B1 | — | — | None | — | — | US | disclosed |
| WO-2025045206-A1 | PYRUVIC ACID (HETERO)ARYL THIOESTER COMPOUNDS FOR LED PHOTOPOLYMERIZATION, PREPARATION THEREFOR AND USE THEREOF | 湖北固润科技股份有限公司 | 2025-03-06 | — | — | WO | disclosed |
| CN-112154149-B | New vinylphosphines and photoinitiators obtainable therefrom | 汉斯约尔格·格吕茨马赫 | 2025-02-21 | — | — | CN | disclosed |
| CN-115504896-B | Acrylic formate compound for LED photopolymerization, preparation method and application thereof | 湖北固润科技股份有限公司 | 2024-05-07 | — | — | CN | disclosed |
| WO-2024078413-A1 | ACRYLOYL FORMATE COMPOUND FOR LED PHOTOPOLYMERIZATION, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 湖北固润科技股份有限公司 | 2024-04-18 | — | — | WO | disclosed |
| CN-117142994-A | Amphiphilic polyether alpha-ketone (hetero) arylthioester compound for LED photopolymerization and preparation and application thereof | 湖北固润科技股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-117142995-A | Pyruvic acid (hetero) arylthioester compound for LED photopolymerization and preparation and application thereof | 湖北固润科技股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-115504896-A | Acryloyl formate compound for LED photopolymerization, and preparation method and application thereof | 湖北固润科技股份有限公司 | 2022-12-23 | — | — | CN | disclosed |
| CN-114181249-A | Derivatives of bisacylphosphinic acids, their preparation and their use as photoinitiators | IGM集团公司 | 2022-03-15 | — | — | CN | disclosed |
| EP-3765471-A1 | NOVEL VINYL PHOSPHINES AND PHOTO-INITIATORS OBTAINABLE THEREFROM | Grützmacher, Hansjörg (CH) | 2021-01-20 | — | — | EP | disclosed |
| EP-1011030-A1 | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2000-06-21 | — | — | EP | disclosed |
| EP-0992850-A2 | Planographic printing original plate | FUJI PHOTO FILM CO., LTD. (JP) | 2000-04-12 | — | — | EP | disclosed |
| EP-0965887-A1 | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-12-22 | — | — | EP | disclosed |
| EP-0949539-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0722121-B1 | Photosensitive planographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 1999-04-28 | — | — | EP | disclosed |
| EP-0907107-A2 | Package of photosensitive planographic printing plates and photosensitive planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-04-07 | — | — | EP | disclosed |
| EP-0904954-A2 | Positive working photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-03-31 | — | — | EP | disclosed |
| EP-0871070-A2 | Positive working photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1998-10-14 | — | — | EP | disclosed |
| EP-0722121-A1 | Photosensitive planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-17 | — | — | EP | disclosed |
| US-4873166-A | Liquid developer for electrophotography | MITSUBISHI PAPER MILLS, LTD. (JP) | 1989-10-10 | — | — | US | disclosed |