SCHEMBL5163044

SCHEMBL5163044

COc1ccc(C[SiH3])cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 3/20 0.58
CA12 O43570 1/20 0.58
CA1 P00915 1/20 0.58
CA2 P00918 1/20 0.58
CA7 P43166 1/20 0.58
CA9 Q16790 1/20 0.58
CA14 Q9ULX7 1/20 0.58
AGXT P21549 2/20 0.54
LTA4H P09960 1/20 0.54
TAAR1 Q96RJ0 1/20 0.54
ALDH1A1 P00352 2/20 0.52
ALOX15 P16050 2/20 0.52
TP53 P04637 1/20 0.52
CYP3A4 P08684 1/20 0.52
TSHR P16473 1/20 0.52
ALOX12 P18054 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
SLC6A4 P31645 1/20 0.50
CALM1 P0DP23 1/20 0.48
KDM4E B2RXH2 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6835490 0.80 TAAR1 (0.61) IDO1CA12CA1CA2CA7
Hydrochloric Acid SCHEMBL8009496 0.78 TAAR1 (0.59) IDO1CA12CA1CA2CA7
SCHEMBL27884 0.78 LTA4H (0.81) IDO1CA12CA1CA2CA7
SCHEMBL1425001 0.78 LTA4H (0.81) IDO1CA12CA1CA2CA7
SCHEMBL834551 0.78 TAAR1 (0.73) IDO1CA12CA1CA2CA7
SCHEMBL15233009 0.77 CALM1 (0.62) IDO1CA12CA1CA2CA7
1,4-Dimethoxybenzene SCHEMBL8489 0.76 CA1 (1.00) IDO1CA12CA1CA2CA7
1,4-Dimethoxybenzene SCHEMBL21802643 0.76 CA1 (1.00) IDO1CA12CA1CA2CA7
Ammonia Solution, Strong SCHEMBL20919857 0.76 LTA4H (0.77) IDO1CA12CA1CA2CA7
SCHEMBL30878 0.76 CA12 (0.61) IDO1CA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022138648-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 東京応化工業株式会社 2022-06-30 WO disclosed
CN-104081282-B Use the solvent development manufacturing method of the semiconductor device for the composition for forming siliceous resist lower membrane 日产化学工业株式会社 2019-07-30 CN disclosed
CN-104081282-A Semiconductor device manufacturing method using silicon-containing resist underlayer film forming composition for solvent development NISSAN CHEMICAL IND LTD 2014-10-01 CN disclosed
CN-101437853-B Biocompatible three dimensional matrix for the immobilization of biological substances LEUKOCARE AG 2012-07-04 CN disclosed
EP-1234829-B1 SILICON-CONTAINING POLYMERS NAT INST OF ADVANCED IND SCIEN (JP) 2007-03-07 EP disclosed
US-7074523-B2 Lithium secondary battery HITACHI, LTD. (JP) 2006-07-11 US disclosed
US-6753401-B1 DEHYDROGENATIVE POLYMERIZATION OF QUINONE AND/OR DIOL WITH TRIHYDROSILANE OR DIHYDROSILANE IN PRESENCE OF PALLADIUM-CONTAINING CATALYST; POLYSILANES NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-06-22 US disclosed
US-20040106039-A1 nonaqueous electrolytic solution containing a compound that is oxidized at a voltage > a charge end voltage of the battery and a compound which inhibits reactions at voltages < the charge end voltage ARAI JUICHI (JP) 2004-06-03 US disclosed
US-20030003370-A1 Nonaqueous electrolytic solution containing a compound which is oxidized at a voltage higher than a charge end voltage of the lithium secondary battery and a compound which inhibits reactions at voltages lower than said charge end voltage. HITACHI, LTD. (JP) 2003-01-02 US disclosed
EP-1258939-A2 Lithium secondary battery Hitachi, Ltd. (JP) 2002-11-20 EP disclosed
EP-1234829-A1 SILICON-CONTAINING POLYMERS National Institute of Advanced Industrial Science and Technology (JP) 2002-08-28 EP disclosed
EP-0900225-A1 ALKYL-4-SILYL-PHENOLS AND ESTERS THEREOF AS ANTIATHEROSCLEROTIC AGENTS HOECHST MARION ROUSSEL, INC. (US) 1999-03-10 EP disclosed
WO-1997041129-A1 ALKYL-4-SILYL-PHENOLS AND ESTERS THEREOF AS ANTIATHEROSCLEROTIC AGENTS HOECHST MARION ROUSSEL, INC. (US) 1997-11-06 WO disclosed
US-5608095-A Alkyl-4-silyl-phenols and esters thereof as antiatherosclerotic agents HOECHST MARION ROUSSEL, INC. (US) 1997-03-04 US disclosed