Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 4/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | PTGDR | Q13258 | 1/20 | 0.37 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.37 |
| ▸ | GABRA1 | P14867 | 4/20 | 0.37 |
| ▸ | GABRB2 | P47870 | 4/20 | 0.37 |
| ▸ | POLB | P06746 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | HPGD | P15428 | 3/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | CNR1 | P21554 | 2/20 | 0.33 |
| ▸ | CNR2 | P34972 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.33 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.33 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29225947 | 0.90 | GABRA1 (0.41) | GAATSHRPTGDRPTGDR2GABRA1 | |
| SCHEMBL22160245 | 0.86 | GABRA1 (0.38) | GAATSHRPTGDRPTGDR2GABRA1 | |
| SCHEMBL2053985 | 0.85 | GABRA1 (0.41) | GAATSHRPTGDRPTGDR2GABRA1 | |
| SCHEMBL5175539 | 0.81 | TSHR (0.37) | GAATSHRPTGDRPTGDR2GABRA1 | |
| SCHEMBL6535892 | 0.79 | GABRA1 (0.39) | GAATSHRPTGDRPTGDR2GABRA1 | |
| SCHEMBL5187070 | 0.78 | KDM4E (0.38) | GAATSHRGABRA1GABRB2POLB | |
| SCHEMBL2535160 | 0.77 | PTGDR (0.36) | GAATSHRPTGDRPTGDR2GABRA1 | |
| SCHEMBL9081528 | 0.76 | IDO1 (0.42) | GAATSHRPTGDRPTGDR2GABRA1 | |
| SCHEMBL11500121 | 0.75 | ALDH1A1 (0.39) | GAATSHRGABRA1GABRB2POLB | |
| SCHEMBL278481 | 0.74 | KDM4E (0.46) | GAATSHRPTGDRPTGDR2GABRA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6600053-B2 | Useful for producing polyimide precursors or polyimides having low thermal expansion and low residual stress | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2003-07-29 | — | — | US | claimed |
| US-20020037991-A1 | Photosensitive resin composition | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2002-03-28 | — | — | US | claimed |
| EP-1013650-A2 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-06-28 | — | — | EP | claimed |
| EP-1013650-B1 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | HITACHI CHEM DUPONT MICROSYS (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-6600053-B2 | Useful for producing polyimide precursors or polyimides having low thermal expansion and low residual stress | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2003-07-29 | — | — | US | disclosed |
| US-6600053-B2 | Useful for producing polyimide precursors or polyimides having low thermal expansion and low residual stress | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2003-07-29 | — | — | US | disclosed |
| US-20020037991-A1 | Photosensitive resin composition | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2002-03-28 | — | — | US | disclosed |
| US-20020037991-A1 | Photosensitive resin composition | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2002-03-28 | — | — | US | disclosed |
| US-6329494-B1 | HIGH-SPEED DEVELOPABILITY, HIGH RESOLUTION AND GOOD DIMENSIONAL ACCURACY TO SUIT THEM TO THE PRODUCTION OF INTERLAYER INSULATING FILMS OR SURFACE-PROTECTING FILMS IN SEMICONDUCTOR DEVICES | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2001-12-11 | — | — | US | disclosed |
| EP-1013650-A3 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2001-10-24 | — | — | EP | disclosed |
| JP-2000281671-A | TETRACARBOXYLIC DIANHYDRIDE, ITS DERIVATIVE AND PRODUCTION, POLYIMIDE PRECURSOR, POLYIMIDE, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION OF RELIEF PATTERN, AND ELECTRONIC PART | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD | 2000-10-10 | — | — | JP | disclosed |
| EP-1013650-A2 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-06-28 | — | — | EP | disclosed |
| EP-1013650-A2 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-06-28 | — | — | EP | disclosed |