Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | PRKCA | P17252 | 1/20 | 0.37 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 2/20 | 0.36 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.36 |
| ▸ | GMNN | O75496 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | THPO | P40225 | 1/20 | 0.36 |
| ▸ | MTOR | P42345 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL28426479 | 0.98 | LMNA (0.46) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A | |
| Ethylene Glycol SCHEMBL25303850 | 0.98 | LMNA (0.46) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A | |
| Ethylene Glycol SCHEMBL25305037 | 0.98 | LMNA (0.46) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A | |
| Ethylene Glycol SCHEMBL2369306 | 0.96 | LMNA (0.40) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A | |
| Ethylene Glycol SCHEMBL7524210 | 0.93 | ALDH1A1 (0.44) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A | |
| Ethylene Glycol SCHEMBL9296590 | 0.91 | LMNA (0.46) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A | |
| SCHEMBL134089 | 0.91 | OPRM1 (0.42) | LMNATSHRSPHK1OPRM1FDPS | |
| Ethylene Glycol SCHEMBL18227077 | 0.90 | LMNA (0.36) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A | |
| Ethylene Glycol SCHEMBL23391403 | 0.88 | LMNA (0.50) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A | |
| Ethylene Glycol SCHEMBL23391391 | 0.88 | LMNA (0.50) | LMNASMN1; SMN2ALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5202222-A | Electrodeposition of photoresist, exposure, development for controlled removal, then cleaning and metal plating | SHIPLEY COMPANY INC. (US) | 1993-04-13 | — | — | US | claimed |
| EP-0507043-A2 | Selective and precise etching and plating of conductive substrates | SHIPLEY COMPANY INC. (US) | 1992-10-07 | — | — | EP | claimed |
| EP-0449022-A2 | Method of controlling photoresist film thickness and stability of an electrodeposition bath | SHIPLEY COMPANY INC. (US) | 1991-10-02 | — | — | EP | claimed |
| EP-0407951-A2 | Method for applying a photoresist to a 3-D conductive substrate | SHIPLEY COMPANY INC. (US) | 1991-01-16 | — | — | EP | claimed |
| JP-4228598-A | — | — | None | — | — | JP | disclosed |
| EP-4729588-A1 | CATIONIC ELECTRODEPOSITED PAINT COMPOSITION AND METHOD FOR FORMING CURED ELECTRODEPOSITED COATING | Nippon Paint Automotive Coatings Co., Ltd. (JP) | 2026-04-22 | — | — | EP | disclosed |
| US-12540249-B2 | Cationic electrodeposition coating composition | NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD. (JP) | 2026-02-03 | — | — | US | disclosed |
| US-12480005-B2 | Method for preparing cationic electrodeposition coating composition | NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD. (JP) | 2025-11-25 | — | — | US | disclosed |
| US-20250208503-A1 | PHOTOSENSITIVE CONDUCTIVE PASTE, METHOD FOR PRODUCING LAMINATED ELECTRONIC COMPONENT, AND LAMINATED ELECTRONIC COMPONENT | MURATA MANUFACTURING CO., LTD. (JP) | 2025-06-26 | — | — | US | disclosed |
| US-20250210217-A1 | PHOTOSENSITIVE CONDUCTIVE PASTE, METHOD FOR PRODUCING LAMINATED ELECTRONIC COMPONENT, AND LAMINATED ELECTRONIC COMPONENT | MURATA MANUFACTURING CO., LTD. (JP) | 2025-06-26 | — | — | US | disclosed |
| CN-120199611-A | Photosensitive conductive paste, method for producing laminated electronic component, and laminated electronic component | 株式会社村田制作所 | 2025-06-24 | — | — | CN | disclosed |
| WO-2025110027-A1 | CATIONIC ELECTRODEPOSITION COATING COMPOSITION AND METHOD FOR PRODUCING CATIONIC ELECTRODEPOSITION COATING COMPOSITION | 日本ペイント・オートモーティブコーティングス株式会社 | 2025-05-30 | — | — | WO | disclosed |
| EP-0507158-B1 | Refrigerating machine oil composition | IDEMITSU KOSAN CO (JP) | 1997-08-20 | — | — | EP | disclosed |
| EP-0739973-A1 | Refrigerating machine oil composition | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1996-10-30 | — | — | EP | disclosed |
| US-5310492-A | Wear resistance, lubricant oil and metal carboxylate | IDEMITSU KOSAN CO., LTD. (JP) | 1994-05-10 | — | — | US | disclosed |
| US-5202222-A | Electrodeposition of photoresist, exposure, development for controlled removal, then cleaning and metal plating | SHIPLEY COMPANY INC. (US) | 1993-04-13 | — | — | US | disclosed |
| EP-0507043-A2 | Selective and precise etching and plating of conductive substrates | SHIPLEY COMPANY INC. (US) | 1992-10-07 | — | — | EP | disclosed |
| EP-0507158-A1 | Refrigerating machine oil composition | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-10-07 | — | — | EP | disclosed |
| JP-H04228598-A | ADJUSTMENT OF THICKNESS OF PHOTORESIST FILM AND STABILITY OF ELECTRODEPOSITION VESSEL | SHIPLEY CO INC | 1992-08-18 | — | — | JP | disclosed |
| EP-0449022-A2 | Method of controlling photoresist film thickness and stability of an electrodeposition bath | SHIPLEY COMPANY INC. (US) | 1991-10-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12540249-B2 | Cationic electrodeposition coating composition | RFT1, EHMT1, BPNT1 | LMNA 805/4885SMN1; SMN2 1467/4885ALDH1A1 1104/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.