Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BRAF | P15056 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 11/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 11/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.38 |
| ▸ | HTT | P42858 | 5/20 | 0.38 |
| ▸ | RAB9A | P51151 | 5/20 | 0.38 |
| ▸ | MEN1 | O00255 | 4/20 | 0.38 |
| ▸ | NPC1 | O15118 | 4/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.38 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.38 |
| ▸ | RELA | Q04206 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 4/20 | 0.33 |
| ▸ | HPGD | P15428 | 5/20 | 0.32 |
| ▸ | BLM | P54132 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.32 |
| ▸ | MAOA | P21397 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13742201 | 1.00 | BRAF (0.41) | BRAFMAPTALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL25422554 | 0.85 | BRAF (0.47) | BRAFMAPTALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL498610 | 0.85 | BRAF (0.47) | BRAFMAPTALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL498611 | 0.85 | BRAF (0.47) | BRAFMAPTALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL5187607 | 0.82 | CYP1A2 (0.34) | — | |
| SCHEMBL19320476 | 0.81 | BRAF (0.44) | BRAFMAPTALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL30724511 | 0.77 | BRAF (0.40) | BRAFMAPTALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL13883530 | 0.76 | BRAF (0.40) | BRAFMAPTALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL21603035 | 0.75 | GRM4 (0.46) | MAPTALDH1A1KDM4ESMN1; SMN2KMT2A | |
| SCHEMBL17122503 | 0.75 | BRAF (0.42) | BRAFMAPTALDH1A1KDM4ESMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 475 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118311830-A | Photosensitive composition | 富士胶片株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-118318193-A | Circular polarizing plate with adhesive layer | 住友化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-112280567-B | Composition comprising compound functioning as dichromatic pigment | 住友化学株式会社 | 2024-06-25 | — | — | CN | disclosed |
| CN-118244579-A | Colored curable composition, color filter and display device | 住友化学株式会社 | 2024-06-25 | — | — | CN | disclosed |
| CN-118244578-A | Colored curable composition, color filter and display device | 住友化学株式会社 | 2024-06-25 | — | — | CN | disclosed |
| CN-118226708-A | Colored curable resin composition, color filter, display device, and solid-state imaging element | 住友化学株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-118215714-A | Resin composition, resin film and display device | 住友化学株式会社 | 2024-06-18 | — | — | CN | disclosed |
| CN-118202003-A | Resin film and display device | 住友化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-118202005-A | Resin composition, resin film and display device | 住友化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-118202004-A | Resin composition, resin film and display device | 住友化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-101434682-A | Polymer resin composition | SUMITOMO CHEMICAL CO (JP) | 2009-05-20 | — | — | CN | disclosed |
| CN-101373329-A | Colored cured composition | SUMITOMO CHEMICAL CO (JP) | 2009-02-25 | — | — | CN | disclosed |
| CN-100462796-C | Color filter, photoresist composition therefor and regulation method thereof | SUMITOMO CHEMICAL CO (JP) | 2009-02-18 | — | — | CN | disclosed |
| EP-1864186-A2 | POSITIVE PHOTORESIST COMPOSITION, THICK FILM PHOTORESIST LAMINATE, METHOD FOR PRODUCING THICK FILM RESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-12-12 | — | — | EP | disclosed |
| CN-1904732-A | Photosensitive resin composition for photosensitive clearance material | SUMITOMO CHEMICAL CO (JP) | 2007-01-31 | — | — | CN | disclosed |
| WO-2006107010-A2 | POSITIVE PHOTORESIST COMPOSITION, THICK FILM PHOTORESIST LAMINATE, METHOD FOR PRODUCING THICK FILM RESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-10-12 | — | — | WO | disclosed |
| CN-1834164-A | Pigmentation combination | SUMITOMO CHEMICAL CO (JP) | 2006-09-20 | — | — | CN | disclosed |
| CN-1254702-C | Colored photosensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2006-05-03 | — | — | CN | disclosed |
| CN-1609709-A | Black photosensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2005-04-27 | — | — | CN | disclosed |
| CN-1517726-A | Dyeing photoresist composition for color filter | 住友化学工业株式会社 | 2004-08-04 | — | — | CN | disclosed |