SCHEMBL498611

SCHEMBL498611

Cc1ccc(C=Cc2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)o1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BRAF P15056 1/20 0.47
ALDH1A1 P00352 12/20 0.41
MAPT P10636 10/20 0.41
KDM4E B2RXH2 9/20 0.41
SMN1; SMN2 Q16637 8/20 0.41
RAB9A P51151 7/20 0.41
KMT2A Q03164 6/20 0.41
MEN1 O00255 5/20 0.41
NPC1 O15118 5/20 0.41
HTT P42858 3/20 0.41
LMNA P02545 3/20 0.41
NFKB1 P19838 1/20 0.41
NFKB2 Q00653 1/20 0.41
RELA Q04206 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
PKM P14618 3/20 0.36
HPGD P15428 5/20 0.35
MAOA P21397 1/20 0.34
MAOB P27338 1/20 0.34
ALOX5 P09917 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL498610 1.00 BRAF (0.47) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL25422554 1.00 BRAF (0.47) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL19320476 0.92 BRAF (0.44) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL30724511 0.91 BRAF (0.40) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL13883530 0.86 BRAF (0.40) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL17122503 0.85 BRAF (0.42) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL13742201 0.85 BRAF (0.41) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL5188282 0.85 BRAF (0.41) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL4531763 0.85 BRAF (0.43) BRAFALDH1A1MAPTKDM4ESMN1; SMN2
SCHEMBL499088 0.80 CYP1A2 (0.36) BRAF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1555 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120065626-A Photocurable composition 茂名清荷科技有限公司 2025-05-30 CN claimed
CN-119668028-A Negative photoresist composition, application thereof and imaging method 福建泓光半导体材料有限公司 2025-03-21 CN claimed
CN-115903376-B Photoresist, photoresist combination product and photoresist patterning method 清华大学 2025-01-14 CN claimed
US-20240168374-A1 PHOTORESIST COMPOSITION TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2024-05-23 US claimed
WO-2023101104-A1 PHOTOCURABLE INK COMPOSITION AND OPTICAL PRINTING METHOD USING SAME 울산과학기술원 2023-06-08 WO claimed
CN-115903376-A Photoresist, photoresist combination product and photoresist patterning method 清华大学 2023-04-04 CN claimed
US-9244354-B2 Method for producing thick film photoresist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-01-26 US claimed
WO-2026100726-A1 DECORATIVE FILM, ELECTRONIC MEMBER, AND TOUCH PAD JSR株式会社 2026-05-15 WO disclosed
CN-116323748-B Ultraviolet curable composition and use thereof 陶氏东丽株式会社 2026-05-12 CN disclosed
US-20260117026-A1 DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES MERCK PATENT GMBH (DE) 2026-04-30 US disclosed
US-20260098128-A1 CURABLE BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE THEREOF DOW TORAY CO LTD (JP) 2026-04-09 US disclosed
US-20260085194-A1 OPTICAL PRODUCT TOKYO OHKA KOGYO CO LTD (JP) 2026-03-26 US disclosed
US-12583975-B2 UV-curable organopolysiloxane composition and use thereof DOW TORAY CO., LTD. (JP) 2026-03-24 US disclosed
US-5955241-A Chemical-amplification-type negative resist composition and method for forming negative resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 1999-09-21 US disclosed
US-5929271-A Compounds for use in a positive-working resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1999-07-27 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed
US-5817444-A POLYHYDROXYSTYRENE SUBSTITUTED WITH TETRAHYDROPYRAN GROUPS, POLYHYDROXYSTYRENE SUBSTITUTED WITH ALKOXYALKYL GROUPS TOKYO OHKA KOGYO CO., LTD. (JP) 1998-10-06 US disclosed
US-5789136-A Negative-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-08-04 US disclosed
US-5700625-A Negative-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-12-23 US disclosed
US-5368783-A Novolak resin or polyhydroxystyrene resin, alkoxymethylated amino resin and triazine TOKYO OHKA KOGYO CO., LTD. (JP) 1994-11-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260085194-A1 OPTICAL PRODUCT PFN1, CFL1, C9 BRAF 3071/4885ALDH1A1 2131/4885MAPT 444/4885
US-20260098128-A1 CURABLE BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE THEREOF COL2A1, COL1A1, SEM1 BRAF 3477/4885ALDH1A1 1729/4885MAPT 3200/4885
US-20260117026-A1 DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES KCNE1, GLRB, PBRM1 BRAF 2637/4885ALDH1A1 1854/4885MAPT 2622/4885
US-12583975-B2 UV-curable organopolysiloxane composition and use thereof F12, FUCA1, XPA BRAF 2396/4885ALDH1A1 1322/4885MAPT 4363/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.