Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | KCNQ3 | O43525 | 1/20 | 0.31 |
| ▸ | KCNQ2 | O43526 | 1/20 | 0.31 |
| ▸ | KCNQ4 | P56696 | 1/20 | 0.31 |
| ▸ | KCNQ5 | Q9NR82 | 1/20 | 0.31 |
| ▸ | GBA1 | P04062 | 1/20 | 0.30 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9934752 | 0.86 | CYP19A1 (0.38) | CYP19A1HSD11B1POLBMEN1KMT2A | |
| SCHEMBL5194757 | 0.86 | CYP19A1 (0.38) | CYP19A1HSD11B1POLBMEN1KMT2A | |
| SCHEMBL24502169 | 0.82 | CYP19A1 (0.36) | CYP19A1HSD11B1POLBMEN1KMT2A | |
| SCHEMBL28204575 | 0.80 | CYP19A1 (0.40) | CYP19A1POLBMEN1KMT2AGAA | |
| SCHEMBL19865846 | 0.80 | CYP19A1 (0.33) | CYP19A1POLBMEN1KMT2AGAA | |
| SCHEMBL18560088 | 0.79 | CYP19A1 (0.35) | CYP19A1HSD11B1 | |
| SCHEMBL438933 | 0.79 | CYP19A1 (0.35) | CYP19A1HSD11B1 | |
| SCHEMBL12972013 | 0.79 | CYP19A1 (0.35) | CYP19A1HSD11B1POLBMAPTEPHX2 | |
| SCHEMBL32688990 | 0.77 | POLB (0.34) | CYP19A1HSD11B1POLBMEN1KMT2A | |
| SCHEMBL19454864 | 0.76 | CYP19A1 (0.32) | CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9052593-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20140205947-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2014-07-24 | — | — | US | disclosed |
| US-20140205947-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2014-07-24 | — | — | US | disclosed |
| US-8722319-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-05-13 | — | — | US | disclosed |
| US-8722319-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-05-13 | — | — | US | disclosed |
| US-20120077122-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120077122-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| EP-1288186-B1 | Preparation process of vinyl ether compounds | DAICEL CHEM (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-7271297-B2 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2007-09-18 | — | — | US | disclosed |
| EP-1826196-A2 | Vinyl ether compounds | Daicel Chemical Industries, Ltd. (JP) | 2007-08-29 | — | — | EP | disclosed |
| US-20060205957-A1 | Process for producing vinyl ether compounds | ISHII YASUTAKA | 2006-09-14 | — | — | US | disclosed |
| US-7074970-B2 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-11 | — | — | US | disclosed |
| EP-1288186-A2 | Vinyl ether compounds and preparation process thereof | Daicel Chemical Industries, Ltd. (JP) | 2003-03-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060205957-A1 | Process for producing vinyl ether compounds | ETV6, CYP3A4, SUV39H2 | CYP19A1 211/4885HSD11B1 91/4885POLB 3232/4885 |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | COASY, DHCR24, HCAR1 | CYP19A1 168/4885HSD11B1 14/4885POLB 2064/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.