⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10484400 | 0.71 | ALDH1A1 (0.31) | — | |
| SCHEMBL10673165 | 0.71 | — | — | |
| SCHEMBL19724923 | 0.69 | — | — | |
| SCHEMBL7191074 | 0.69 | ALDH1A1 (0.36) | — | |
| SCHEMBL4011907 | 0.67 | — | — | |
| SCHEMBL10665441 | 0.66 | — | — | |
| SCHEMBL16478989 | 0.65 | CRHBP (0.37) | — | |
| SCHEMBL9820230 | 0.65 | SMN1; SMN2 (0.32) | — | |
| SCHEMBL20284620 | 0.65 | — | — | |
| SCHEMBL243842 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108659233-A | A kind of rubber and plastic free radical quenching type Polymeric stabilizer | 湖南辰砾新材料有限公司 | 2018-10-16 | — | — | CN | claimed |
| CN-106831539-A | The synthesis of polyamide stabilizer | 湘潭大学 | 2017-06-13 | — | — | CN | claimed |
| CN-105315463-B | Polymer, aligning agent for liquid crystal, liquid crystal orientation film and liquid crystal display element | 捷恩智株式会社 | 2019-11-26 | — | — | CN | disclosed |
| CN-109912498-A | A kind of preparation method of light stabilizer | 南通大学 | 2019-06-21 | — | — | CN | disclosed |
| CN-106831539-B | The synthesis of polyamide stabilizer | 湘潭大学 | 2019-02-01 | — | — | CN | disclosed |
| CN-108164509-A | A kind of multi-mode molecular probe | 浙江大学 | 2018-06-15 | — | — | CN | disclosed |
| CN-101046632-B | Planographic printing plate precursor | FUJI PHOTO FILM CO LTD | 2011-05-11 | — | — | CN | disclosed |
| CN-100495208-C | Lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2009-06-03 | — | — | CN | disclosed |
| CN-101046633-A | Planographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2007-10-03 | — | — | CN | disclosed |
| CN-101046632-A | Planographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2007-10-03 | — | — | CN | disclosed |
| EP-1640805-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2007-08-22 | — | — | EP | disclosed |
| US-6777155-B2 | PHOTOSENSITIVE LAYER INCLUDES A POLYURETHANE RESIN BINDER COMPRISING AN ALIPHATIC CYCLIC STRUCTURE WHICH HAS A CARBOXYL GROUP AS A SUBSTITUENT | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-17 | — | — | US | disclosed |
| CN-1499294-A | Lithographic printing plate precursor | ��ʿ��Ƭ��ʽ���� | 2004-05-26 | — | — | CN | disclosed |
| US-20020136987-A1 | Photosensitive layer includes a polyurethane resin binder comprising an aliphatic cyclic structure which has a carboxyl group as a substituent | FUJIFILM CORPORATION (JP) | 2002-09-26 | — | — | US | disclosed |
| EP-1195646-A1 | Photosensitive lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-10 | — | — | EP | disclosed |
| CN-1306224-A | Iodonium salt used as potential acid provider | CIBA SPECIATY CHEMICALS HOLDIN (CH) | 2001-08-01 | — | — | CN | disclosed |
| EP-0558047-B1 | Copolymer having amino group and process for production thereof | DAI ICHI KOGYO SEIYAKU CO LTD (JP) | 1998-05-20 | — | — | EP | disclosed |
| EP-0355645-B1 | Cyclic amidines and process for their preparation | BAYER AG (DE) | 1994-04-27 | — | — | EP | disclosed |
| EP-0558047-A2 | Copolymer having amino group and process for production thereof | DAI-ICHI KOGYO SEIYAKU Co., Ltd. (JP) | 1993-09-01 | — | — | EP | disclosed |
| EP-0355645-A2 | Cyclic amidines and process for their preparation | BAYER AG (DE) | 1990-02-28 | — | — | EP | disclosed |