Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.60 |
| ▸ | NPC1 | O15118 | 2/20 | 0.60 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.60 |
| ▸ | HTT | P42858 | 1/20 | 0.60 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.59 |
| ▸ | LMNA | P02545 | 2/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.57 |
| ▸ | GAA | P10253 | 3/20 | 0.57 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.50 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.45 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | CES2 | O00748 | 1/20 | 0.45 |
| ▸ | CES1 | P23141 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5032456 | 0.90 | CES2 (0.51) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| SCHEMBL8320768 | 0.90 | MAPT (0.54) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| SCHEMBL10954535 | 0.90 | MAPT (0.54) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| SCHEMBL145078 | 0.89 | MAPT (0.61) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| SCHEMBL5286383 | 0.86 | MAPT (0.50) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| SCHEMBL4140404 | 0.83 | CES2 (0.59) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| Benzenethiol SCHEMBL27501880 | 0.82 | MAPT (0.53) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| SCHEMBL9856886 | 0.82 | ALDH1A1 (0.62) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| SCHEMBL4639277 | 0.81 | MAPT (0.71) | MAPTNPC1MAPK1HTTL3MBTL1 | |
| SCHEMBL11852104 | 0.81 | ALDH1A1 (0.60) | MAPTNPC1MAPK1HTTL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2101 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115340784-B | Solder resist ink with reflection performance, circuit board and display device | 广州华星光电半导体显示技术有限公司 | 2023-08-01 | — | — | CN | claimed |
| CN-115340784-A | Solder resist ink with reflection performance, circuit board and display device | 广州华星光电半导体显示技术有限公司 | 2022-11-15 | — | — | CN | claimed |
| CN-113198302-A | SRR free radical cluster medicament for treating various VOCs (volatile organic compounds) foul waste gas | 成都安捷芮环保科技有限公司 | 2021-08-03 | — | — | CN | claimed |
| CN-110317473-B | Preparation method of photo-induced and thermochromic microcapsule | 上海炬通实业有限公司 | 2021-04-09 | — | — | CN | claimed |
| CN-109880217-A | A kind of green biodegradable plastics film and its processing technology | 广州思薇伦特美容生物科技有限公司 | 2019-06-14 | — | — | CN | claimed |
| US-10005915-B2 | High-stretch energy curable inks and method of use in heat transfer label applications | SUN CHEMICAL CORPORATION (US) | 2018-06-26 | — | — | US | claimed |
| EP-3257677-A1 | INKS OR COATINGS AND METHOD OF USE IN HEAT TRANSFER LABEL APPLICATIONS | Sun Chemical Corporation (US) | 2017-12-20 | — | — | EP | claimed |
| US-9631068-B2 | Photo-curable resin composition and method for forming a fine pattern using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2017-04-25 | — | — | US | claimed |
| US-20160272791-A1 | PHOTO-CURABLE RESIN COMPOSITION AND METHOD FOR FORMING A FINE PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-09-22 | — | — | US | claimed |
| US-20160137857-A1 | HIGH-STRETCH ENERGY CURABLE INKS & METHOD OF USE IN HEAT TRANSFER LABEL APPLICATIONS | SUN CHEMICAL CORPORATION (US) | 2016-05-19 | — | — | US | claimed |
| US-20040253536-A1 | Photosensitive metal nanoparticle and method of forming conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-16 | — | — | US | claimed |
| US-20040142272-A1 | Photoresist composition and method pattern forming using the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2004-07-22 | — | — | US | claimed |
| US-20040101634-A1 | Method of forming a patterned film of surface-modified carbon nanotubes | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-05-27 | — | — | US | claimed |
| EP-1422563-A1 | Method of forming a patterned film of surface-modified carbon nanotubes | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-05-26 | — | — | EP | claimed |
| US-6432616-B1 | Water soluble polymer and photoresist composition containing the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2002-08-13 | — | — | US | claimed |
| US-6326122-B1 | HEAT SENSITIVE ELEMENTS | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-12-04 | — | — | US | claimed |
| US-5698611-A | ACRYLATED ESTER | GC CORPORATION (JP) | 1997-12-16 | — | — | US | claimed |
| US-4996132-A | Heat-resistant photosensitive resin composition | TOYKO OHKA KOGYO CO. LTD. (JP) | 1991-02-26 | — | — | US | claimed |
| US-4975471-A | Photo-curable epoxy resin type composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-12-04 | — | — | US | claimed |
| EP-0280295-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-08-31 | — | — | EP | claimed |