SCHEMBL523127

SCHEMBL523127

C=C(CCCCCOC)C(=O)O

nearest known ligand 0.63

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.63
TBXAS1 P24557 2/20 0.40
TSHR P16473 5/20 0.38
THRB P10828 1/20 0.34
FNTA P49354 1/20 0.34
FNTB P49356 1/20 0.34
PGGT1B P53609 1/20 0.34
LMNA P02545 3/20 0.33
NFKB1 P19838 1/20 0.33
PMP22 Q01453 1/20 0.33
EPHX2 P34913 1/20 0.33
KDM4E B2RXH2 1/20 0.33
TET2 Q6N021 1/20 0.32
DGKA P23743 1/20 0.32
SLC22A6 Q4U2R8 1/20 0.32
SLC22A8 Q8TCC7 1/20 0.32
GPR84 Q9NQS5 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16291990 1.00 ALDH1A1 (0.63) ALDH1A1TBXAS1TSHRTHRBFNTA
SCHEMBL16291638 1.00 ALDH1A1 (0.63) ALDH1A1TBXAS1TSHRTHRBFNTA
SCHEMBL16292006 1.00 ALDH1A1 (0.63) ALDH1A1TBXAS1TSHRTHRBFNTA
SCHEMBL456879 0.98 ALDH1A1 (0.59) ALDH1A1TBXAS1TSHRTHRBFNTA
SCHEMBL156151 0.91 ALDH1A1 (0.50) ALDH1A1TBXAS1TSHRLMNAKDM4E
SCHEMBL13684994 0.90 ALDH1A1 (0.52) ALDH1A1TBXAS1TSHRLMNAEPHX2
Methacrylic Acid SCHEMBL8740910 0.90 ALDH1A1 (0.52) ALDH1A1TBXAS1TSHRTHRBFNTA
SCHEMBL13685002 0.90 ALDH1A1 (0.52) ALDH1A1TBXAS1TSHRLMNAEPHX2
SCHEMBL8928146 0.89 ALDH1A1 (0.50) ALDH1A1TBXAS1TSHRTHRBFNTA
SCHEMBL14659937 0.88 ALDH1A1 (0.47) ALDH1A1TBXAS1TSHRLMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 174 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3858879-B1 COPOLYMER FOR SUPPRESSING PROTEIN ADSORPTION, METHOD FOR PRODUCING COPOLYMER, RESIN MODIFIER, MOLDING MATERIAL, COPOLYMER-CONTAINING COMPOSITION, COATING FILM AND ARTICLE MITSUBISHI CHEM CORP (JP) 2025-01-01 EP claimed
EP-3914661-B1 REACTIVE 2-COMPONENT ADHESIVE SYSTEM IN FILM FORM BASED ON ODOR-NEUTRAL ACRYLIC MONOMERS TESA SE (DE) 2024-05-08 EP claimed
EP-3914661-A1 REACTIVE 2-COMPONENT ADHESIVE SYSTEM IN FILM FORM BASED ON ODOR-NEUTRAL ACRYLIC MONOMERS tesa SE (DE) 2021-12-01 EP claimed
WO-2020152147-A1 REACTIVE 2-COMPONENT ADHESIVE SYSTEM IN FILM FORM BASED ON ODOR-NEUTRAL ACRYLIC MONOMERS TESA SE (DE) 2020-07-30 WO claimed
US-7208544-B2 Quality finishes without ruptures and/or craters; acryl base copolymer containing trimethylsilyl groups; small amount KUSUMOTO CHEMICALS, LTD. (JP) 2007-04-24 US claimed
EP-1266913-B1 Flow-and-leveling agents for powder coatings KUSUMOTO CHEMICALS (JP) 2006-08-02 EP claimed
EP-1266914-B1 Flow-and-levelling agents for waterborne coatings KUSUMOTO CHEMICALS (JP) 2006-08-02 EP claimed
WO-2003038022-A1 AGENTS CONTAINING BETAINE ESTERS HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2003-05-08 WO claimed
EP-0657751-B1 Soft ocular lens material MENICON CO LTD (JP) 2003-04-23 EP claimed
EP-1273567-A2 Betaine esters Goldschmidt AG (DE) 2003-01-08 EP claimed
EP-1035141-A1 Bead polymers with narrow particle size distribution Bayer Aktiengesellschaft (DE) 2000-09-13 EP claimed
US-5519070-A FLUORINE, ALKOXY POLYSILOXANE COPOLYMERS FOR INTRAOCULAR LENSES MENICON CO., LTD. (JP) 1996-05-21 US claimed
WO-2024126304-A1 AQUEOUS COMPOSITIONS COMPRISING (METH)ACRYLATE GROUP CARRYING POLYURETHANE WHICH YIELD CROSS-LINKED LAYERS OF HIGH HARDNESS AND GOOD ADHESION BASF SE (DE) 2024-06-20 WO disclosed
EP-3914661-B1 REACTIVE 2-COMPONENT ADHESIVE SYSTEM IN FILM FORM BASED ON ODOR-NEUTRAL ACRYLIC MONOMERS TESA SE (DE) 2024-05-08 EP disclosed
WO-2024042892-A1 ADHESIVE COMPOSITION AND OPTICAL LAMINATED BODY WITH ADHESIVE LAYER 綜研化学株式会社 2024-02-29 WO disclosed
WO-2024024613-A1 COATED ARTICLE AND PRODUCTION METHOD THEREFOR 信越化学工業株式会社 2024-02-01 WO disclosed
EP-0332165-A2 Silver halide color reversal photographic light-sensitive material Fuji Photo Film Co., Ltd. (JP) 1989-09-13 EP disclosed
EP-0309529-A1 MOULD INSERT WITH SCRATCH-RESISTANT POLISHED MOULD SURFACE FOR MANUFACTURE OF PLASTIC PARTS OPT ENGINEERING AG (CH) 1989-04-05 EP disclosed
WO-1988007924-A1 MOULD INSERT WITH SCRATCH-RESISTANT POLISHED MOULD SURFACE FOR MANUFACTURE OF PLASTIC PARTS OPT ENGINEERING AG (CH) 1988-10-20 WO disclosed
EP-0170184-A2 Process for the preparation of drying aqueous varnishes with a polybutadiene/maleic-acid anhydride binder BAYER AG (DE) 1986-02-05 EP disclosed