Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL524017 | 1.00 | GLA (0.44) | GLAHSD11B1L3MBTL1KDM4EHTT | |
| Methacrylic Acid SCHEMBL6737395 | 0.83 | GLA (0.34) | GLAHSD11B1L3MBTL1KDM4EHTT | |
| SCHEMBL2026422 | 0.83 | GLA (0.44) | GLAHSD11B1L3MBTL1KDM4EHTT | |
| SCHEMBL906383 | 0.83 | GLA (0.44) | GLAHSD11B1L3MBTL1KDM4EHTT | |
| SCHEMBL1218819 | 0.83 | GLA (0.44) | GLAHSD11B1L3MBTL1KDM4EHTT | |
| SCHEMBL4102876 | 0.81 | HSD11B1 (0.47) | HSD11B1L3MBTL1KDM4EALDH1A1THRB | |
| SCHEMBL827747 | 0.81 | TSHR (0.41) | GLAL3MBTL1HTTALDH1A1MAPT | |
| SCHEMBL245977 | 0.79 | ALDH1A1 (0.37) | GLAHTTALDH1A1 | |
| SCHEMBL3766816 | 0.79 | ALDH1A1 (0.34) | GLAHTTALDH1A1 | |
| SCHEMBL16583214 | 0.79 | GLA (0.50) | GLAALDH1A1EPHX1CA2EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 228 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2687568-B1 | Adhesive, adhesive tape, and display device | SAMSUNG DISPLAY CO LTD (KR) | 2018-05-16 | — | — | EP | claimed |
| US-8557501-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | claimed |
| US-20120178029-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-12 | — | — | US | claimed |
| US-8182978-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-22 | — | — | US | claimed |
| US-20090181171-A1 | Method of Controlling Orientation of Domains in Block Copolymer Films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | claimed |
| EP-0590573-B1 | Resin for plastic lens | HITACHI CHEMICAL CO LTD (JP) | 1998-01-07 | — | — | EP | claimed |
| US-20240055382-A1 | METALLIZATION METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-02-15 | — | — | US | disclosed |
| US-20230420401-A1 | METALLIZATION METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-12-28 | — | — | US | disclosed |
| US-20210294148-A1 | Planarizing Organic Films | TOKYO ELECTRON LIMITED (JP) | 2021-09-23 | — | — | US | disclosed |
| WO-2021188352-A1 | PLANARIZING ORGANIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2021-09-23 | — | — | WO | disclosed |
| EP-2420891-B1 | Process for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2021-06-23 | — | — | EP | disclosed |
| US-11016388-B2 | Overcoat compositions and methods for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-05-25 | — | — | US | disclosed |
| US-10558122-B2 | Compositions comprising sulfonamide material and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2020-02-11 | — | — | US | disclosed |
| US-20020058198-A1 | Fluorinated phenolic polymers and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. | 2002-05-16 | — | — | US | disclosed |
| WO-2002021212-A2 | FLUORINATED PHENOLIC POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-14 | — | — | WO | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |
| WO-2002017019-A2 | OXIME SULFONATE AND N-OXYIMIDOSULFONATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-02-28 | — | — | WO | disclosed |
| US-6235851-B1 | ESTERIFICATION OR AMIDATION REACTION OF AN ADAMANTANE DERIVATIVE; GROUP 3A METAL CATALYST | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-0915077-A1 | POLYMERIZABLE ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | Daicel Chemical Industries, Ltd. (JP) | 1999-05-12 | — | — | EP | disclosed |
| US-5514753-A | SYNTHETIC RUBBERS, FORMING LIVING POLYMERS | BRIDGESTONE CORPORATION (JP) | 1996-05-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11016388-B2 | Overcoat compositions and methods for photolithography | OGT, COLGALT1, PARG | GLA 1055/4885HSD11B1 3249/4885L3MBTL1 245/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.