Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.52 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.40 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.40 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.40 |
| ▸ | PGR | P06401 | 1/20 | 0.40 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.40 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.40 |
| ▸ | HTR1A | P08908 | 1/20 | 0.40 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.40 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.40 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.40 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.40 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.40 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.40 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | GALR3 | O60755 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15070973 | 0.92 | ALDH1A1 (0.48) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL4951128 | 0.87 | ALDH1A1 (0.52) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL523505 | 0.86 | ALDH1A1 (0.44) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL133944 | 0.84 | ALDH1A1 (0.54) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL11057569 | 0.84 | ALDH1A1 (0.35) | ALDH1A1 | |
| Methyl Alcohol SCHEMBL28209288 | 0.83 | ALDH1A1 (0.52) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL13006965 | 0.82 | ALDH1A1 (0.56) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL632865 | 0.80 | TSHR (0.55) | ALDH1A1TSHRHTTCA2CA1 | |
| SCHEMBL1225553 | 0.79 | ALDH1A1 (0.48) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL1225287 | 0.79 | ALDH1A1 (0.48) | ALDH1A1CHRM5CHRM1CHRM3PGR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3307816-B1 | HIGH STRENGTH AND MOISTURE RESISTANT ADHESIVE | BISON INT B V (NL) | 2025-02-26 | — | — | EP | claimed |
| CN-111883748-A | Method for coating oxide film on surface of lithium ion battery anode powder material | 华南理工大学 | 2020-11-03 | — | — | CN | claimed |
| EP-3307816-A1 | HIGH STRENGTH AND MOISTURE RESISTANT ADHESIVE | Bison International B.v. (NL) | 2018-04-18 | — | — | EP | claimed |
| WO-2016202359-A1 | HIGH STRENGTH AND MOISTURE RESISTANT ADHESIVE | BISON INTERNATIONAL B.V. (NL) | 2016-12-22 | — | — | WO | claimed |
| US-8039049-B2 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2011-10-18 | — | — | US | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| WO-2007040834-A2 | PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040816-A2 | TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040856-A2 | PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| US-6046293-A | Solid-liquid phase interfacial polymerization | UNIVERSITY OF SOUTH AUSTRALIA (AU) | 2000-04-04 | — | — | US | claimed |
| EP-0799851-A2 | Preparation of polyorganosilloxanes by interfacial polymerization | DOW CORNING CORPORATION (US) | 1997-10-08 | — | — | EP | claimed |
| US-5629401-A | Preparation of polyorganosiloxanes by interfacial polymerization | DOW CORNING CORPORATION (US) | 1997-05-13 | — | — | US | claimed |
| EP-3307816-B1 | HIGH STRENGTH AND MOISTURE RESISTANT ADHESIVE | BISON INT B V (NL) | 2025-02-26 | — | — | EP | disclosed |
| US-3948963-A | CATALYSTS | TH. GOLDSCHMIDT AG (DT) | 1976-04-06 | — | — | US | disclosed |