SCHEMBL524943

SCHEMBL524943

CCC(C[SiH](Cl)Cl)OC(C)=O

nearest known ligand 0.36

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.35
LMNA P02545 2/20 0.35
MEN1 O00255 1/20 0.35
CYP1A2 P05177 1/20 0.35
HRH1 P35367 1/20 0.35
KMT2A Q03164 1/20 0.35
SLC18A3 Q16572 1/20 0.34
PRKCA P17252 2/20 0.33
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
CHRM1 P11229 1/20 0.32
TBXA2R P21731 1/20 0.32
GALR3 O60755 1/20 0.31
MAPT P10636 1/20 0.31
BLM P54132 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1155311 0.81 TSHR (0.36) TSHRALDH1A1
SCHEMBL1584634 0.79
SCHEMBL17138326 0.79 TSHR (0.36) TSHRSMN1; SMN2LMNAMEN1CYP1A2
SCHEMBL963721 0.78 TSHR (0.34) TSHRSMN1; SMN2LMNAMEN1CYP1A2
SCHEMBL2143892 0.77 TSHR (0.36) TSHRALDH1A1HSD17B10
SCHEMBL3341053 0.76 LMNA (0.33) TSHRSMN1; SMN2LMNAMEN1CYP1A2
SCHEMBL5091229 0.76 PRKCA (0.32) PRKCA
SCHEMBL523506 0.74 TSHR (0.48) TSHRSMN1; SMN2CHRM2CHRM4CHRM1
SCHEMBL14409324 0.73
SCHEMBL1220663 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111883748-A Method for coating oxide film on surface of lithium ion battery anode powder material 华南理工大学 2020-11-03 CN claimed
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
US-7405168-B2 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMITED (JP) 2008-07-29 US claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
CN-111883748-A Method for coating oxide film on surface of lithium ion battery anode powder material 华南理工大学 2020-11-03 CN disclosed
CN-104974184-B preparation of silazane Compounds 信越化学工业株式会社 2019-12-06 CN disclosed
EP-2930177-B1 PREPARATION OF SILAZANE COMPOUND SHINETSU CHEMICAL CO (JP) 2018-04-25 EP disclosed
US-9416147-B2 Preparation of silazane compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-16 US disclosed
US-20030072932-A1 Transparent substrate coated with a polymer layer SAINT-GOBAIN GLASS FRANCE (FR) 2003-04-17 US disclosed
EP-1261557-A1 TRANSPARENT SUBSTRATE COATED WITH A POLYMER LAYER SAINT-GOBAIN GLASS FRANCE (FR) 2002-12-04 EP disclosed
WO-2001066481-A1 TRANSPARENT SUBSTRATE COATED WITH A POLYMER LAYER SAINT-GOBAIN GLASS FRANCE (FR) 2001-09-13 WO disclosed
US-3948963-A CATALYSTS TH. GOLDSCHMIDT AG (DT) 1976-04-06 US disclosed