Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | UGT2B7 | P16662 | 1/20 | 0.49 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.45 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.45 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.45 |
| ▸ | MMP9 | P14780 | 1/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.39 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.39 |
| ▸ | TPH1 | P17752 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11142197 | 0.95 | UGT2B7 (0.44) | UGT2B7ADRA2AADRA2BADRA2CMMP9 | |
| SCHEMBL12383206 | 0.88 | UGT2B7 (0.47) | UGT2B7ADRA2AADRA2BADRA2CMMP9 | |
| SCHEMBL26861535 | 0.85 | CYP2C9 (0.38) | MEN1KMT2ACYP1A2TSHR | |
| SCHEMBL12383178 | 0.85 | AKR1C3 (0.56) | CYP1A2TSHR | |
| SCHEMBL26861550 | 0.84 | CYP2C9 (0.40) | MEN1KMT2ACYP1A2TSHR | |
| SCHEMBL10120468 | 0.84 | UGT2B7 (0.55) | UGT2B7ADRA2AADRA2BADRA2CMMP9 | |
| SCHEMBL7514315 | 0.84 | UGT2B7 (0.55) | UGT2B7ADRA2AADRA2BADRA2CMMP9 | |
| SCHEMBL26861538 | 0.83 | AKR1B1 (0.40) | UGT2B7ADRA2AADRA2BADRA2CMMP9 | |
| SCHEMBL26861536 | 0.82 | HSD17B1 (0.40) | CYP1A2 | |
| SCHEMBL14258939 | 0.82 | TSHR (0.41) | MEN1KMT2ATSHRATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119899310-A | Acrylate polymer, ultraviolet-curable adhesive composition and polarizer | 恒美光电股份有限公司 | 2025-04-29 | — | — | CN | claimed |
| CN-117858592-A | Efficient and stable perovskite thin film, solar cell device and preparation method | 西安天交新能源有限公司 | 2024-04-09 | — | — | CN | claimed |
| CN-106886127-A | Photoimprint resin composition, photoimprint resin film, and patterning process | 财团法人工业技术研究院 | 2017-06-23 | — | — | CN | claimed |
| WO-2007110387-A1 | PHOTO-CURABLE RESINS AND RESIN COMPOSITIONS WITH VERY HIGH REFRACTIVE INDICES FOR APPLICATION IN PLASIC OPTICS | SEEREAL TECHNOLOGIES S.A. (DE) | 2007-10-04 | — | — | WO | claimed |
| EP-1840652-A1 | Photo-curable resins and resin compositions with very high refractive indices for application in plastic optics | SeeReal Technologies S.A. (LU) | 2007-10-03 | — | — | EP | claimed |
| CN-119899310-A | Acrylate polymer, ultraviolet-curable adhesive composition and polarizer | 恒美光电股份有限公司 | 2025-04-29 | — | — | CN | disclosed |
| CN-115975105-B | Soft intraocular lens material and soft intraocular lens | 株式会社尼德克 | 2024-11-19 | — | — | CN | disclosed |
| US-20240241441-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20240241440-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20090170029-A1 | (Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods | CHEIL INDUSTRIES, INC. (KR) | 2009-07-02 | — | — | US | disclosed |
| US-20090170029-A1 | (Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods | CHEIL INDUSTRIES, INC. (KR) | 2009-07-02 | — | — | US | disclosed |
| CN-101462956-A | (meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods | CHEIL IND INC (KR) | 2009-06-24 | — | — | CN | disclosed |
| WO-2007110387-A1 | PHOTO-CURABLE RESINS AND RESIN COMPOSITIONS WITH VERY HIGH REFRACTIVE INDICES FOR APPLICATION IN PLASIC OPTICS | SEEREAL TECHNOLOGIES S.A. (DE) | 2007-10-04 | — | — | WO | disclosed |
| WO-2007110387-A1 | PHOTO-CURABLE RESINS AND RESIN COMPOSITIONS WITH VERY HIGH REFRACTIVE INDICES FOR APPLICATION IN PLASIC OPTICS | SEEREAL TECHNOLOGIES S.A. (DE) | 2007-10-04 | — | — | WO | disclosed |
| EP-1840652-A1 | Photo-curable resins and resin compositions with very high refractive indices for application in plastic optics | SeeReal Technologies S.A. (LU) | 2007-10-03 | — | — | EP | disclosed |
| EP-1840652-A1 | Photo-curable resins and resin compositions with very high refractive indices for application in plastic optics | SeeReal Technologies S.A. (LU) | 2007-10-03 | — | — | EP | disclosed |
| US-5919555-A | MULTILAYER; TRANSPARENT SUPPORT, LOW REFRACTIVE INDEX LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 1999-07-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | UGT2B7 4242/4885ADRA2A 1197/4885ADRA2B 1773/4885 |
| US-20090170029-A1 | (Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods | AHR, PAH, MC1R | UGT2B7 1518/4885ADRA2A 911/4885ADRA2B 899/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | UGT2B7 996/4885ADRA2A 2053/4885ADRA2B 2278/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.