⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL459148 | 1.00 | — | — | |
| Nitric Acid SCHEMBL398144 | 0.75 | — | — | |
| SCHEMBL12483617 | 0.72 | — | — | |
| SCHEMBL305514 | 0.72 | — | — | |
| Nitric Acid SCHEMBL13560601 | 0.67 | — | — | |
| Nitric Acid SCHEMBL5162028 | 0.67 | CA5A (0.80) | — | |
| Methane SCHEMBL23726043 | 0.67 | — | — | |
| SCHEMBL28412085 | 0.67 | — | — | |
| Ammonia Solution, Strong SCHEMBL4116843 | 0.67 | — | — | |
| SCHEMBL29615688 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109153886-A | Chemically-mechanicapolish polish purposes of (CMP) composition in substrate of the polishing comprising cobalt and/or cobalt alloy | 巴斯夫欧洲公司 | 2019-01-04 | — | — | CN | disclosed |
| CN-108779367-A | Chemically-mechanicapolish polish purposes of (CMP) composition in polishing the base material comprising cobalt and/or cobalt alloy | 巴斯夫欧洲公司 | 2018-11-09 | — | — | CN | disclosed |
| CN-103210047-B | The diazene * dioxide of the substitution containing N and/or the aqueous polishing composition of N '-hydroxyls-diazene * oxide salts | 巴斯夫欧洲公司 | 2018-07-17 | — | — | CN | disclosed |
| CN-103210047-B | The diazene * dioxide of the substitution containing N and/or the aqueous polishing composition of N '-hydroxyls-diazene * oxide salts | 巴斯夫欧洲公司 | 2018-07-17 | — | — | CN | disclosed |
| CN-108276915-A | Aqueous polishing composition and method for chemically-mechanicapolish polishing the substrate for including silicon oxide dielectric and polysilicon film | 巴斯夫欧洲公司 | 2018-07-13 | — | — | CN | disclosed |
| CN-108178988-A | Chemical-mechanical polishing compositions comprising nonionic surfactant and carbonate | 巴斯夫欧洲公司 | 2018-06-19 | — | — | CN | disclosed |
| CN-107406721-A | Chemical Mechanical Polishing (CMP) compositions for high efficiency polishing of germanium-containing substrates | 巴斯夫欧洲公司 | 2017-11-28 | — | — | CN | disclosed |
| CN-103975001-B | Prepare the method and its application of CMP composition | 巴斯夫欧洲公司 | 2017-09-01 | — | — | CN | disclosed |
| CN-107109132-A | Use of Chemical Mechanical Polishing (CMP) compositions for polishing substrates comprising cobalt and/or cobalt alloys | 巴斯夫欧洲公司 | 2017-08-29 | — | — | CN | disclosed |
| CN-107109133-A | Use of Chemical Mechanical Polishing (CMP) compositions for polishing substrates comprising cobalt and/or cobalt alloys | 巴斯夫欧洲公司 | 2017-08-29 | — | — | CN | disclosed |
| CN-107109134-A | Chemically-mechanicapolish polish purposes of (CMP) composition in base material of the polishing comprising cobalt and/or cobalt alloy | 巴斯夫欧洲公司 | 2017-08-29 | — | — | CN | disclosed |
| CN-106661382-A | chemical mechanical polishing (CMP) composition | 巴斯夫欧洲公司 | 2017-05-10 | — | — | CN | disclosed |
| US-20130213116-A1 | METHOD AND DEVICE FOR LAND MINE DETECTION BY NITROGEN GAS | ZENGIN AHMET (TR) | 2013-08-22 | — | — | US | disclosed |
| WO-2012015368-A2 | METHOD AND DEVICE FOR LAND MINE DETECTION BY NITROGEN GAS METHOD | ZENGIN AHMET (TR) | 2012-02-02 | — | — | WO | disclosed |
| US-20100255121-A1 | Hard Surface Treatment Compositions with Improved Mold or Fungi Remediation Properties | RECKITT & COLMAN (OVERSEAS) LIMITED (GB) | 2010-10-07 | — | — | US | disclosed |