SCHEMBL5282987

SCHEMBL5282987

C=C(CC(=O)OCCC)C(=O)OC

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.38
GAA P10253 2/20 0.38
MGAM O43451 1/20 0.38
SI P14410 1/20 0.38
MGAM2 Q2M2H8 1/20 0.38
FAAH O00519 2/20 0.37
TSHR P16473 2/20 0.36
NAAA Q02083 1/20 0.35
DGKA P23743 1/20 0.35
HCAR2 Q8TDS4 1/20 0.34
THRB P10828 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
LMNA P02545 1/20 0.32
TET2 Q6N021 1/20 0.32
USP2 O75604 1/20 0.32
GLA P06280 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL481222 0.90 TSHR (0.41) ALDH1A1GAAMGAMSIMGAM2
SCHEMBL6657456 0.89 FAAH (0.46) ALDH1A1FAAHTSHRNAAADGKA
SCHEMBL5284811 0.86 MGAM (0.46) ALDH1A1GAAMGAMSIMGAM2
SCHEMBL22615726 0.85 NAAA (0.56) FAAHTSHRNAAADGKA
SCHEMBL27879430 0.85 NAAA (0.56) FAAHTSHRNAAADGKA
SCHEMBL27416292 0.85 GAA (0.35) ALDH1A1GAAMGAMSIMGAM2
SCHEMBL6519648 0.85 GAA (0.35) ALDH1A1GAAMGAMSIMGAM2
SCHEMBL3886490 0.84 TSHR (0.40) ALDH1A1GAAMGAMSIMGAM2
SCHEMBL8462266 0.84 ALDH1A1 (0.38) ALDH1A1GAAMGAMSIMGAM2
SCHEMBL5276345 0.83 GAA (0.58) ALDH1A1GAAMGAMSIMGAM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100545183-C Multipolymer and dispersion agent NIPPON CATALYTIC CHEM IND (JP) 2009-09-30 CN disclosed
EP-1281516-B1 Planographic printing plate precursor FUJIFILM CORP (JP) 2007-12-19 EP disclosed
CN-101014636-A Copolymer and dispersant NIPPON CATALYTIC CHEM IND (JP) 2007-08-08 CN disclosed
WO-2006028252-A1 COPOLYMER AND DISPERSANT NIPPON SHOKUBAI CO., LTD. (JP) 2006-03-16 WO disclosed
US-6951171-B2 Using graft polymer on etched or anodized aluminum substrate FUJI PHOTO FILM CO., LTD. (JP) 2005-10-04 US disclosed
EP-1048457-B1 Lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2004-12-15 EP disclosed
EP-1123915-B1 Process for producing alpha, beta-unsaturated carboxylic acid esters and catalyst for use in such process NIPPON CATALYTIC CHEM IND (JP) 2004-07-28 EP disclosed
EP-1031414-B1 Lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2004-06-16 EP disclosed
US-20030129520-A1 Using graft polymer on etched or anodized aluminum substrate FUJIFILM CORPORATION (JP) 2003-07-10 US disclosed
US-6541656-B2 Reacting an alpha, beta unsaturated carboxylic acid ester with a heterocyclic oxygen nitrogen, or sulfur compound NIPPON SHOKUBAI COMPANY, LTD. (JP) 2003-04-01 US disclosed
EP-1281516-A2 Planographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2003-02-05 EP disclosed
US-6509132-B1 Comprises an ink-receptive image area for receiving ink during the printing process and a hydrophilic non-image area for receiving fountain solution FUJI PHOTO FILM CO., LTD. (JP) 2003-01-21 US disclosed
US-6455224-B1 SUPPORT WITH HYDROPHILIC SURFACE AND PHOTOSENSITIVE LAYER CONTAINING INFRARED ABSORBENT WHICH CHANGES FROM HYDROPHILIC TO HYDROPHOBIC BY HEAT AND HYDROPHILIC POLYMER HAVING FUNCTIONAL GROUP RENDERING LAYER WATER DEVELOPABLE FUJI PHOTO FILM CO., LTD. (JP) 2002-09-24 US disclosed
US-20010034300-A1 Reacting an alpha, beta unsaturated carboxylic acid ester with a heterocyclic oxygen nitrogen, or sulfur compound NIPPON SHOKUBAI COMPANY LTD. (JP) 2001-10-25 US disclosed
EP-1123915-A1 Process for producing alpha, beta-unsaturated carboxylic acid esters and catalyst for use in such process Nippon Shokubai Co., Ltd. (JP) 2001-08-16 EP disclosed
EP-1048457-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2000-11-02 EP disclosed
EP-1031414-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2000-08-30 EP disclosed