SCHEMBL529997

SCHEMBL529997

O=C(O)c1ccccc1C(=O)OCC1CO1

nearest known ligand 0.61

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
DHFR P00374 1/20 0.54
ALDH1A1 P00352 1/20 0.54
MAPK1 P28482 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
MGLL Q99685 5/20 0.51
TDP1 Q9NUW8 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21801769 1.00 DHFR (0.54) DHFRALDH1A1MAPK1L3MBTL1MGLL
SCHEMBL30541879 1.00 DHFR (0.54) DHFRALDH1A1MAPK1L3MBTL1MGLL
Cyclohexane SCHEMBL28117089 0.97 DHFR (0.52) DHFRALDH1A1MAPK1L3MBTL1MGLL
SCHEMBL29374975 0.93 DHFR (0.59) DHFRALDH1A1MAPK1L3MBTL1MGLL
SCHEMBL121520 0.93 DHFR (0.59) DHFRALDH1A1MAPK1L3MBTL1MGLL
SCHEMBL21801767 0.93 DHFR (0.59) DHFRALDH1A1MAPK1L3MBTL1MGLL
Propene SCHEMBL9132191 0.92 DHFR (0.48) DHFRALDH1A1MAPK1L3MBTL1MGLL
Acrylic Acid SCHEMBL28214340 0.92 DHFR (0.48) DHFRALDH1A1MAPK1L3MBTL1MGLL
SCHEMBL27625461 0.89 MGLL (0.51) DHFRMAPK1L3MBTL1MGLL
SCHEMBL28387457 0.89 DHFR (0.55) DHFRMAPK1L3MBTL1MGLLTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 813 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120029006-A Photosensitive resin composition, photosensitive dry film, cured film, circuit board and display module 杭州福斯特电子材料有限公司 2025-05-23 CN claimed
CN-119570202-A Epoxy resin system for low-viscosity high-Tg prepreg yarns and preparation method thereof 安徽佳力奇先进复合材料科技股份公司 2025-03-07 CN claimed
CN-119264777-A Pump body anti-abrasion protective coating material and preparation method thereof 宁夏正禹工程技术有限公司 2025-01-07 CN claimed
CN-119219894-A Method for synthesizing epoxy resin material by recycling nylon acid 河南城建学院 2024-12-31 CN claimed
CN-118363265-A Photosensitive resin composition, dry film solder resist, solder resist layer and printed circuit board 杭州福斯特电子材料有限公司 2024-07-19 CN claimed
CN-116285830-B Thermosetting adhesive, adhesive tape and preparation method thereof 湖南联兴光电科技有限公司 2023-12-08 CN claimed
CN-116648806-A Electrolyte, secondary battery, battery module, battery pack, and electricity-using device 宁德时代新能源科技股份有限公司 2023-08-25 CN claimed
CN-116285830-A Thermosetting adhesive, adhesive tape and preparation method thereof 湖南联兴光电科技有限公司 2023-06-23 CN claimed
EP-4184648-A1 ELECTROLYTE, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND POWER-CONSUMING APPARATUS Contemporary Amperex Technology Co., Limited (CN) 2023-05-24 EP claimed
US-20230094322-A1 ELECTROLYTE, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK AND POWER CONSUMPTION APPARATUS CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) 2023-03-30 US claimed
JP-H09506659-A 1997-06-30 JP claimed
EP-0734424-A1 POLYGLYCIDYL ESTER-BASED POWDER COATINGS AMOCO CORPORATION (US) 1996-10-02 EP claimed
WO-1995016753-A1 POLYGLYCIDYL ESTER-BASED POWDER COATINGS AMOCO CORPORATION (US) 1995-06-22 WO claimed
US-5321101-A Polycarbodiimides; high strength, heat resistance, fireproof and melt processability NISSHINBO INDUSTRIES, INC. (JP) 1994-06-14 US claimed
EP-0588533-A2 Printed thermoplastic resin products and method for printing such products HAYAKAWA RUBBER COMPANY LIMITED (JP) 1994-03-23 EP claimed
EP-0588534-A2 Radiation curing ink HAYAKAWA RUBBER COMPANY LIMITED (JP) 1994-03-23 EP claimed
CN-1084193-A Ink composite HAYAKAWA RUBBER (JP) 1994-03-23 CN claimed
EP-0240421-B1 REINFORCED EPOXY RESIN COMPOSITION, IN PARTICULAR IN THE FORM OF PREPREGS, STARTING PRODUCT FOR COMPOSITES, THE OBTAINED COMPOSITES AND EPOXY RESINS CONTAINING SULPHONE GROUPS SOCIETE NATIONALE ELF AQUITAINE (FR) 1991-12-18 EP claimed
US-4189414-A QUATERNARY AMMONIUM SILICATE KOWA CHEMICAL INDUSTRY LTD. (JP) 1980-02-19 US claimed
US-4017434-A Diallyl phthalate resin-containing aqueous emulsions OSAKA SODA CO., LTD. (JA) 1977-04-12 US claimed