Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.48 |
| ▸ | IDO1 | P14902 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | AGXT | P21549 | 1/20 | 0.43 |
| ▸ | BCHE | P06276 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.41 |
| ▸ | HTR1A | P08908 | 1/20 | 0.41 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.41 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.41 |
| ▸ | DRD1 | P21728 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.41 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.41 |
| ▸ | DRD3 | P35462 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10477327 | 0.90 | TSHR (0.47) | TSHRIDO1TP53AGXTBCHE | |
| SCHEMBL14617699 | 0.80 | TSHR (0.46) | TSHRIDO1TP53AGXTBCHE | |
| SCHEMBL4945866 | 0.79 | DRD2 (0.44) | TSHRALDH1A1CYP3A4CYP2C9CYP2C19 | |
| SCHEMBL1703710 | 0.79 | MAOA (0.42) | L3MBTL1CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL10797055 | 0.79 | TSHR (0.50) | TSHRIDO1AGXTBCHEALDH1A1 | |
| SCHEMBL10517766 | 0.77 | TSHR (0.37) | TSHRBCHEALDH1A1CYP3A4CYP2C9 | |
| SCHEMBL10773335 | 0.77 | KCNH2 (0.51) | BCHEOPRM1DRD3KCNH2 | |
| SCHEMBL12812879 | 0.77 | IDO1 (0.55) | IDO1BCHECYP2C19LMNA | |
| SCHEMBL12514967 | 0.77 | ALDH1A1 (0.55) | ALDH1A1 | |
| SCHEMBL24632162 | 0.76 | TSHR (0.52) | TSHRIDO1TP53AGXTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5245024-A | Cellulose chromatography support | LOYOLA UNIVERSITY OF CHICAGO (US) | 1993-09-14 | — | — | US | claimed |
| JP-1216941-A | — | — | None | — | — | JP | disclosed |
| CN-103869613-A | Colored hardening composite, pattern hardeninig colored layer using same, colored filter and liquid crystal display device | SUMITOMO CHEMICAL CO | 2014-06-18 | — | — | CN | disclosed |
| CN-101598897-B | Colored curable composition, pattern-cured colored layer using same, color filter, and liquid crystal display device | SUMITOMO CHEMICAL CO | 2014-05-14 | — | — | CN | disclosed |
| CN-101750890-A | Photosensitive black-colored resin composition, black matrix substrate, and manufacturing method of color filter | SUMITOMO CHEMICAL CO | 2010-06-23 | — | — | CN | disclosed |
| CN-101598897-A | colored curable composition | SUMITOMO CHEMICAL CO (JP) | 2009-12-09 | — | — | CN | disclosed |
| WO-2007139312-A1 | COLORED NEGATIVE PHOTORESIST COMPOSITION, COLORED PATTERN COMPRISING THE SAME, AND METHOD FOR PRODUCING THE COLORED PATTERN | DONGWOO FINE-CHEM. CO., LTD. (KR) | 2007-12-06 | — | — | WO | disclosed |
| CN-100351656-C | Coloration-photosensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2007-11-28 | — | — | CN | disclosed |
| CN-100350281-C | Radioactive-ray sensitive composition for colour optical filter, colouring-layer for mation method and use | JSR CORP (JP) | 2007-11-21 | — | — | CN | disclosed |
| CN-1257434-C | Photosensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2006-05-24 | — | — | CN | disclosed |
| CN-1508574-A | Radioactive-ray sensitive composition for colour optical filter, colouring-layer for mation method and use | JSR株式会社 | 2004-06-30 | — | — | CN | disclosed |
| CN-1504777-A | Coloration-photosensitive resin composition | 住友化学工业株式会社 | 2004-06-16 | — | — | CN | disclosed |
| CN-1435731-A | Photosensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2003-08-13 | — | — | CN | disclosed |
| CN-1067683-C | Substituted morpholine derivatives and their use as therapeutic agents | MERK SHARP & DOHME LTD (GB) | 2001-06-27 | — | — | CN | disclosed |
| CN-1139927-A | Substituted morpholine derivatives and their use as therapeutic agents | MERK SHARP & DOHME LTD (GB) | 1997-01-08 | — | — | CN | disclosed |
| JP-H01216941-A | PRODUCTION OF DIARYLMETHANE COMPOUND | FUJI PHOTO FILM CO LTD | 1989-08-30 | — | — | JP | disclosed |
| US-4797504-A | HYDROXYLAMINES AND PHENYLENEDIAMINE DERIVATIVES | BETZ LABORATORIES, INC. (US) | 1989-01-10 | — | — | US | disclosed |
| EP-0266906-A2 | Method and composition for inhibiting acrylate ester polymerization | BETZ EUROPE, INC. (US) | 1988-05-11 | — | — | EP | disclosed |