SCHEMBL532624

SCHEMBL532624

C/C(=C\c1ccc(-c2ccccc2)cc1)C(=O)O

nearest known ligand 0.77

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.77
TP53 P04637 1/20 0.66
MEN1 O00255 1/20 0.51
POLB P06746 1/20 0.51
KMT2A Q03164 1/20 0.51
MAPT P10636 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
HTT P42858 1/20 0.49
TBXAS1 P24557 4/20 0.48
RXRA P19793 1/20 0.47
RXRB P28702 1/20 0.47
NR4A2 P43354 1/20 0.47
RXRG P48443 1/20 0.47
HDAC2 Q92769 1/20 0.46
RECQL P46063 1/20 0.46
APEX1 P27695 4/20 0.45
ALDH1A1 P00352 1/20 0.44
TSHR P16473 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL532625 1.00 AKR1C3 (0.77) AKR1C3TP53MEN1POLBKMT2A
Biphenyl SCHEMBL28220466 0.94 AKR1C3 (0.88) AKR1C3TP53MEN1KMT2AMAPT
SCHEMBL3414243 0.94 AKR1C3 (0.72) AKR1C3TP53MEN1POLBKMT2A
SCHEMBL2732933 0.94 AKR1C3 (0.72) AKR1C3TP53MEN1POLBKMT2A
SCHEMBL16568719 0.87 AKR1C3 (1.00) AKR1C3MEN1KMT2ASMN1; SMN2HTT
SCHEMBL37034 0.87 AKR1C3 (1.00) AKR1C3MEN1KMT2ASMN1; SMN2HTT
SCHEMBL41906 0.87 AKR1C3 (1.00) AKR1C3MEN1KMT2ASMN1; SMN2HTT
SCHEMBL581982 0.87 AKR1C3 (1.00) AKR1C3MEN1KMT2ASMN1; SMN2HTT
SCHEMBL2462984 0.87 AKR1C3 (0.82) AKR1C3TP53POLBHTTTBXAS1
SCHEMBL2462983 0.87 AKR1C3 (0.82) AKR1C3TP53POLBHTTTBXAS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 238 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0735062-B1 ACTINIC-RADIATION-CURABLE COMPOSITION AND LENS SHEET MITSUBISHI RAYON CO (JP) 2002-01-30 EP claimed
EP-0859819-B1 HEAT-ACTIVATABLE ADHESIVE COMPOSITION MINNESOTA MINING & MFG (US) 1999-12-29 EP claimed
EP-3216838-B1 COMPOSITE SYSTEM WITH MASKING MATERIAL HAVING LOW ADHESION TESA SE (DE) 2026-04-01 EP disclosed
WO-2026047156-A1 POLY(METH)ACRYLATES, PRESSURE-SENSITIVE ADHESIVE COMPOUNDS, AND METHOD FOR THE PRODUCTION THEREOF TESA SE (DE) 2026-03-05 WO disclosed
EP-4688433-A1 FIRE PROTECTION LAMINATE TESA SE (DE) 2026-02-11 EP disclosed
EP-4663714-A1 ADHESIVE MATERIAL, ADHESIVE TAPE, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING THE BONDED COMPOSITE TESA SE (DE) 2025-12-17 EP disclosed
EP-3943283-B1 STAMPED PIECE, IN PARTICULAR FOR PERMANENT CLOSURE OF HOLES TESA SE (DE) 2025-09-03 EP disclosed
EP-4592370-A1 ADHESIVE TAPE, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING BONDED COMPOSITE TESA SE (DE) 2025-07-30 EP disclosed
EP-4377080-B1 PUNCHED ARTICLE, IN PARTICULAR FOR PERMANENTLY CLOSING HOLES TESA SE (DE) 2025-05-28 EP disclosed
EP-3694945-B1 FILLED ADHESIVE COMPOUND TESA SE (DE) 2025-05-21 EP disclosed
EP-3083865-B1 PROCESS FOR PRODUCING CROSSLINKED POLYMERS TESA SE (DE) 2025-04-02 EP disclosed
EP-1460118-A2 Pressure-sensitive hot-melt adhesives with reduced shrinkage, process for its preparation and its utilization tesa AG (DE) 2004-09-22 EP disclosed
EP-1460119-A1 Flameproof adhesive, its production as well as its use in the production of adhesive tape tesa AG (DE) 2004-09-22 EP disclosed
US-20040062939-A1 Polymerizable composition and planogaphic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. 2004-04-01 US disclosed
EP-1400851-A2 Polymerizable composition and planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2004-03-24 EP disclosed
WO-2000001652-A1 NEW INDANONE DERIVATIVES AND METHOD FOR PRODUCING SAME RIEGER BERNHARD (DE) 2000-01-13 WO disclosed
US-5646313-A PREPARING ENKEPHALINASE INHIBITORS SOCIETE CIVILE BIOPROJET (FR) 1997-07-08 US disclosed
US-5612371-A ENZYME INHIBITORS SOCIETE CIVILE BIOPROJECT (FR) 1997-03-18 US disclosed
EP-0212440-B1 RADIATION-SENSITIVE COMPOSITION, REGISTRATION MATERIAL CONTAINING SUCH A COMPOSITION AND PROCESS FOR THE PRODUCTION OF RELIEF IMAGES HOECHST AKTIENGESELLSCHAFT (DE) 1990-06-13 EP disclosed
EP-0212440-A2 Radiation-sensitive composition, registration material containing such a composition and process for the production of relief images HOECHST AKTIENGESELLSCHAFT (DE) 1987-03-04 EP disclosed