Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN9A | Q15858 | 13/20 | 0.36 |
| ▸ | ALOX5AP | P20292 | 1/20 | 0.36 |
| ▸ | FEN1 | P39748 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CYP17A1 | P05093 | 4/20 | 0.34 |
| ▸ | CRHR1 | P34998 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15464143 | 0.77 | CCNT1 (0.45) | SCN9A | |
| SCHEMBL607282 | 0.77 | TSHR (0.35) | — | |
| SCHEMBL28036711 | 0.77 | CYP1A1 (0.51) | CYP3A4CRHR1 | |
| Ammonia Solution, Strong SCHEMBL19740971 | 0.76 | CCNT1 (0.44) | SCN9A | |
| SCHEMBL7107019 | 0.74 | CRHR1 (0.31) | CRHR1 | |
| SCHEMBL1082436 | 0.72 | TSHR (0.32) | — | |
| SCHEMBL174453 | 0.71 | CYP1A2 (0.54) | CYP3A4 | |
| SCHEMBL11216591 | 0.67 | IDO1 (0.47) | CYP3A4 | |
| SCHEMBL29848197 | 0.67 | IDO1 (0.47) | CYP3A4 | |
| SCHEMBL20210912 | 0.65 | SCN9A (0.48) | SCN9AALOX5APFEN1CRHR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3132932-B1 | LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS | PRESSTEK LLC (US) | 2020-04-15 | — | — | EP | disclosed |
| US-20180117900-A1 | EDGE TREATMENT FOR DEVELOP-ON-PRESS LITHOGRAPHIC PRINTING MEMBERS | PRESSTEK, INC. | 2018-05-03 | — | — | US | disclosed |
| EP-3132932-A2 | LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS | Presstek, LLC. (US) | 2017-02-22 | — | — | EP | disclosed |
| US-20170021656-A1 | LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS | PRESSTEK, LLC. | 2017-01-26 | — | — | US | disclosed |
| EP-2033051-B1 | NEGATIVE-WORKING IMAGEABLE ELEMENTS | EASTMAN KODAK CO (US) | 2016-11-30 | — | — | EP | disclosed |
| EP-2217970-B1 | IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS | EASTMAN KODAK CO (US) | 2015-06-03 | — | — | EP | disclosed |
| CN-101884014-B | Imageable elements with components having 1h-tetrazole groups | EASTMAN KODAK CO | 2013-09-18 | — | — | CN | disclosed |
| CN-101971095-B | Negative-working imageable elements with improved abrasion resistance | EASTMAN KODAK CO | 2013-09-04 | — | — | CN | disclosed |
| US-20120231394-A1 | IMAGEABLE ELEMENTS WITH COLORANTS | QUALEX INC. | 2012-09-13 | — | — | US | disclosed |
| CN-101548239-B | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK CO | 2012-07-04 | — | — | CN | disclosed |
| WO-2008073223-A2 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-06-19 | — | — | WO | disclosed |
| US-20080138741-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | BANK OF AMERICA, N.A., AS AGENT | 2008-06-12 | — | — | US | disclosed |
| US-20080085475-A1 | METHOD OF IMAGING AND DEVELOPING NEGATIVE-WORKING ELEMENTS | TAO TING | 2008-04-10 | — | — | US | disclosed |
| WO-2008036170-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-03-27 | — | — | WO | disclosed |
| US-20080070152-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | BANK OF AMERICA, N.A., AS AGENT | 2008-03-20 | — | — | US | disclosed |
| WO-2008027227-A1 | METHOD OF IMAGING AND DEVELOPING NEGATIVE-WORKING ELEMENTS | EASTMAN KODAK COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| US-7326521-B1 | Method of imaging and developing negative-working elements | EASTMAN KODAK COMPANY (US) | 2008-02-05 | — | — | US | disclosed |
| US-20080008957-A1 | Negative-working radiation-sensitive compositions and imageable elements | EASTMAN KODAK COMPANY | 2008-01-10 | — | — | US | disclosed |
| WO-2008002393-A2 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENT | EASTMAN KODAK COMPANY (US) | 2008-01-03 | — | — | WO | disclosed |
| US-7175969-B1 | Method of preparing negative-working radiation-sensitive elements | EASTMAN KODAK COMPANY (US) | 2007-02-13 | — | — | US | disclosed |