SCHEMBL5341985

SCHEMBL5341985

N#CCCCN(CCOC(=O)c1ccccc1)CCOC(=O)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.54
SMN1; SMN2 Q16637 5/20 0.48
LMNA P02545 5/20 0.47
KMT2A Q03164 2/20 0.44
MEN1 O00255 1/20 0.44
ALDH1A1 P00352 3/20 0.44
CYP2D6 P10635 3/20 0.44
CYP1A2 P05177 2/20 0.44
CYP3A4 P08684 2/20 0.44
SCN1A P35498 2/20 0.44
SCN2A Q99250 2/20 0.44
SCN3A Q9NY46 2/20 0.44
SLC6A3 Q01959 2/20 0.44
CHRM2 P08172 1/20 0.44
HTR1A P08908 1/20 0.44
GAA P10253 1/20 0.44
DRD3 P35462 1/20 0.44
KCNH2 Q12809 1/20 0.44
TSHR P16473 2/20 0.43
MAOA P21397 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14399299 0.91 TDP1 (0.53) TDP1SMN1; SMN2LMNAKMT2AMEN1
SCHEMBL5344554 0.91 TDP1 (0.53) TDP1SMN1; SMN2LMNAKMT2AMEN1
SCHEMBL4530882 0.85 TDP1 (0.70) TDP1SMN1; SMN2LMNAKMT2AALDH1A1
SCHEMBL502025 0.84 TDP1 (0.68) TDP1SMN1; SMN2LMNAKMT2AMEN1
SCHEMBL17396777 0.83 TDP1 (0.73) TDP1SMN1; SMN2LMNAKMT2AALDH1A1
SCHEMBL17396705 0.82 TDP1 (0.71) TDP1LMNAKMT2AALDH1A1SLC6A3
SCHEMBL7761107 0.81 TDP1 (0.63) TDP1SMN1; SMN2LMNAKMT2AALDH1A1
SCHEMBL11148968 0.81 LMNA (0.65) TDP1SMN1; SMN2LMNAKMT2AMEN1
SCHEMBL24178227 0.79 LMNA (0.63) TDP1SMN1; SMN2LMNAKMT2AMEN1
SCHEMBL7512736 0.79 TDP1 (0.49) TDP1SMN1; SMN2LMNAKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7276324-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-02 US disclosed
US-20050106500-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-19 US disclosed