Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS3 known ✓ | P29474 | 1/20 | 0.31 |
| ▸ | NOS1 known ✓ | P29475 | 1/20 | 0.31 |
| ▸ | NOS2 known ✓ | P35228 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | MME | P08473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propionic Acid SCHEMBL16738317 | 0.89 | TDP1 (0.42) | TDP1ALDH1A1KDM4EPOLBMME | |
| SCHEMBL534073 | 0.88 | TDP1 (0.43) | TDP1 | |
| SCHEMBL26972745 | 0.86 | TDP1 (0.42) | TDP1 | |
| Acetic Acid SCHEMBL7263283 | 0.85 | ALDH1A1 (0.45) | TDP1ALDH1A1NOS3NOS1NOS2 | |
| SCHEMBL3796222 | 0.83 | TDP1 (0.39) | TDP1ALDH1A1KDM4EPOLB | |
| SCHEMBL25523468 | 0.80 | TDP1 (0.42) | TDP1ALDH1A1 | |
| SCHEMBL12454608 | 0.80 | TDP1 (0.42) | TDP1ALDH1A1 | |
| SCHEMBL11941133 | 0.80 | TDP1 (0.42) | TDP1ALDH1A1 | |
| SCHEMBL15440925 | 0.80 | TDP1 (0.34) | TDP1 | |
| SCHEMBL17704712 | 0.80 | TDP1 (0.34) | TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6063543-A | Radiation-sensitive mixture and its use | SIEMENS AKTIENGESELLSCHAFT (DE) | 2000-05-16 | — | — | US | claimed |
| US-20250239451-A1 | HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2025-07-24 | — | — | US | disclosed |
| US-12187942-B2 | Cadmium free quantum dot including lithium, production method thereof, and electronic device including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-07 | — | — | US | disclosed |
| US-12130508-B2 | Quantum dots and devices including the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2024-10-29 | — | — | US | disclosed |
| US-20240319605-A1 | HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2024-09-26 | — | — | US | disclosed |
| US-12049581-B2 | Zinc tellurium selenium based quantum dot | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-30 | — | — | US | disclosed |
| US-20240176171-A1 | QUANTUM DOTS AND DEVICES INCLUDING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2024-05-30 | — | — | US | disclosed |
| US-11932715-B2 | Hardmask composition and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2024-03-19 | — | — | US | disclosed |
| US-11927838-B2 | Quantum dots and devices including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-03-12 | — | — | US | disclosed |
| US-20230350237-A1 | QUANTUM DOTS AND DEVICES INCLUDING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2023-11-02 | — | — | US | disclosed |
| US-20050179012-A1 | Electrochromic material with improved lifetime | LG CHEM, LTD. (KR) | 2005-08-18 | — | — | US | disclosed |
| WO-2005070993-A2 | NORBORNENE-TYPE MONOMERS AND POLYMERS CONTAINING PENDENT LACTONE OR SULTONE GROUPS | PROMERUS LLC (US) | 2005-08-04 | — | — | WO | disclosed |
| US-20050153233-A1 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups | SUMITOMO BAKELITE CO., LTD. (JP) | 2005-07-14 | — | — | US | disclosed |
| US-20050153240-A1 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups | SUMITOMO BAKELITE CO., LTD. (JP) | 2005-07-14 | — | — | US | disclosed |
| WO-2005062110-A1 | ELECTROCHROMIC MATERIAL WITH IMPROVED LIFETIME | LG CHEM, LTD. (KR) | 2005-07-07 | — | — | WO | disclosed |
| US-20050130057-A1 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| EP-1482361-A1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO., LTD. (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-0695772-B1 | Process for the coating and protection of stony surfaces | AUSIMONT SPA (IT) | 1999-12-01 | — | — | EP | disclosed |
| WO-1997000465-A1 | RESIN COMPOSITIONS FOR PHOTORESIST APPLICATIONS | CLARIANT INTERNATIONAL LTD. (CH) | 1997-01-03 | — | — | WO | disclosed |
| EP-0695772-A1 | Process for the protection of stony or coating surfaces | AUSIMONT S.p.A. (IT) | 1996-02-07 | — | — | EP | disclosed |