Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | MYC | P01106 | 1/20 | 0.36 |
| ▸ | TTR | P02766 | 2/20 | 0.35 |
| ▸ | FABP4 | P15090 | 1/20 | 0.35 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.35 |
| ▸ | CDK2 | P24941 | 1/20 | 0.35 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.35 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.34 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.34 |
| ▸ | MMP2 | P08253 | 6/20 | 0.33 |
| ▸ | MMP1 | P03956 | 5/20 | 0.33 |
| ▸ | MMP9 | P14780 | 5/20 | 0.33 |
| ▸ | MMP8 | P22894 | 5/20 | 0.33 |
| ▸ | MMP13 | P45452 | 5/20 | 0.33 |
| ▸ | CA1 | P00915 | 3/20 | 0.33 |
| ▸ | CA2 | P00918 | 3/20 | 0.33 |
| ▸ | CHAT | P28329 | 1/20 | 0.33 |
| ▸ | SNCA | P37840 | 1/20 | 0.33 |
| ▸ | MMP14 | P50281 | 4/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8507886 | 0.86 | TSHR (0.34) | TSHRSMN1; SMN2MYCTTRFABP4 | |
| SCHEMBL8477910 | 0.81 | CA2 (0.44) | CDK2CA1CA2CA12CA9 | |
| SCHEMBL16720034 | 0.81 | PTGS2 (0.39) | KDM4EALDH1A1L3MBTL1CYP1A2 | |
| SCHEMBL8508966 | 0.81 | CA1 (0.31) | TSHRSMN1; SMN2MMP2MMP1MMP9 | |
| SCHEMBL7448816 | 0.77 | CYP1A2 (0.43) | TSHRMMP2MMP1MMP9MMP8 | |
| SCHEMBL176809 | 0.72 | TTR (0.38) | TSHRSMN1; SMN2MYCTTRFABP4 | |
| SCHEMBL692167 | 0.72 | TTR (0.38) | TSHRSMN1; SMN2MYCTTRFABP4 | |
| SCHEMBL692394 | 0.72 | MYC (0.37) | TSHRSMN1; SMN2MYCTTRFABP4 | |
| SCHEMBL11692937 | 0.71 | TSHR (0.45) | TSHRSMN1; SMN2MYCPOLBALDH1A1 | |
| SCHEMBL5174244 | 0.71 | MYC (0.43) | TSHRSMN1; SMN2MYCTTRFABP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11834532-B2 | Photoinitiators | IGH RESINS ITALIA S.R.L. (IT) | 2023-12-05 | — | — | US | claimed |
| EP-3902878-A1 | PHOTOINITIATORS | IGM Resins Italia S.r.l. (IT) | 2021-11-03 | — | — | EP | claimed |
| WO-2020136522-A1 | PHOTOINITIATORS | IGM RESINS ITALIA S.R.L. (IT) | 2020-07-02 | — | — | WO | claimed |
| US-20050026077-A1 | Forming relief images; for ((opto)electronics; photoresists; mixture of binder and photoactivable compound | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-03 | — | — | US | claimed |
| EP-1407324-A1 | PHOTOIMAGEABLE COMPOSITION | Shipley Company LLC (US) | 2004-04-14 | — | — | EP | claimed |
| US-20030099899-A1 | Photoimageable composition | SHIPLEY COMPANY, L.L.C. | 2003-05-29 | — | — | US | claimed |
| WO-2002091083-A1 | PHOTOIMAGEABLE COMPOSITION | SHIPLEY COMPANY, L.L.C. (US) | 2002-11-14 | — | — | WO | claimed |
| US-4752337-A | Recording liquid for ink jet recording systems | BAYER AKTIENGESELLSCHAFT (DE) | 1988-06-21 | — | — | US | claimed |
| US-4321118-A | Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition | CIBA-GEIGY CORPORATION (US) | 1982-03-23 | — | — | US | claimed |
| US-11834532-B2 | Photoinitiators | IGH RESINS ITALIA S.R.L. (IT) | 2023-12-05 | — | — | US | disclosed |
| CN-113518805-B | Photoinitiator | 意大利艾坚蒙树脂有限公司 | 2023-08-08 | — | — | CN | disclosed |
| EP-3902878-A1 | PHOTOINITIATORS | IGM Resins Italia S.r.l. (IT) | 2021-11-03 | — | — | EP | disclosed |
| CN-113518805-A | Photoinitiator | 意大利艾坚蒙树脂有限公司 | 2021-10-19 | — | — | CN | disclosed |
| CN-109239143-B | Preparation method of nano-copper modified metalloporphyrin nanotube-cadmium sulfide nanosheet composite photosensitive sensing material | 浙江理工大学 | 2020-09-29 | — | — | CN | disclosed |
| US-4379934-A | Process for two-dimensionally concentrating light, and novel perylene-3,4,9,10-tetracarboxylic acid diimides | BASF AKTIENGESELLSCHAFT (DE) | 1983-04-12 | — | — | US | disclosed |
| US-4321118-A | Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition | CIBA-GEIGY CORPORATION (US) | 1982-03-23 | — | — | US | disclosed |
| US-4318791-A | PHOTOPOLYMERIZABLE SYSTEM FOR INKS | CIBA-GEIGY CORPORATION (US) | 1982-03-09 | — | — | US | disclosed |
| US-4315807-A | Sensitizers for photopolymerization | CIBA-GEIGY CORPORATION (US) | 1982-02-16 | — | — | US | disclosed |
| US-4308400-A | AROMATIC HYDROXY KETONES | CIBA-GEIGY A.G. (CH) | 1981-12-29 | — | — | US | disclosed |
| EP-0003002-A2 | Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones | CIBA-GEIGY AG (CH) | 1979-07-11 | — | — | EP | disclosed |