Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM1A | O60341 | 2/20 | 0.41 |
| ▸ | FABP7 | O15540 | 1/20 | 0.41 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 1/20 | 0.38 |
| ▸ | MGLL | Q99685 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1996947 | 0.82 | AKR1C3 (0.51) | FABP7FABP5ALDH1A1LMNAMAPT | |
| SCHEMBL13299640 | 0.78 | MEN1 (0.47) | FABP7FABP5ALDH1A1LMNAMAPT | |
| SCHEMBL10996467 | 0.76 | KMT2A (0.46) | FABP7FABP5ALDH1A1LMNAMAPT | |
| SCHEMBL10996472 | 0.76 | KMT2A (0.46) | FABP7FABP5ALDH1A1LMNAMAPT | |
| SCHEMBL2060119 | 0.74 | AKR1C3 (0.46) | FABP7FABP5ALDH1A1LMNAMAPT | |
| SCHEMBL2703498 | 0.73 | FABP7 (0.44) | FABP7FABP5ALDH1A1LMNAMEN1 | |
| SCHEMBL7105357 | 0.71 | ALDH1A1 (0.52) | ALDH1A1LMNAMAPTMEN1KMT2A | |
| SCHEMBL7105360 | 0.71 | ALDH1A1 (0.52) | ALDH1A1LMNAMAPTMEN1KMT2A | |
| Styrene SCHEMBL3780614 | 0.71 | FABP7 (0.41) | FABP7FABP5ALDH1A1LMNAMAPT | |
| SCHEMBL9355204 | 0.71 | RECQL (0.51) | FABP7FABP5ALDH1A1LMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110526841-B | Onium salt, chemically amplified positive resist composition, and resist pattern forming method | 信越化学工业株式会社 | 2023-06-13 | — | — | CN | disclosed |
| US-11036136-B2 | Onium salt, chemically amplified positive resist composition, and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-15 | — | — | US | disclosed |
| EP-3572877-B1 | ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-09-09 | — | — | EP | disclosed |
| EP-3572877-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-11-27 | — | — | EP | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11036136-B2 | Onium salt, chemically amplified positive resist composition, and resist pattern forming process | SLC6A5, SLC6A9, POLL | KDM1A 3946/4885FABP7 4636/4885FABP5 3301/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.