SCHEMBL5357438

SCHEMBL5357438

COc1ccc([S+]2CCCC2)cc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.36
HTT P42858 1/20 0.36
HSD11B1 P28845 1/20 0.36
ALDH1A1 P00352 4/20 0.35
KDM4E B2RXH2 1/20 0.35
PKM P14618 2/20 0.34
KCNH2 Q12809 1/20 0.33
NPC1 O15118 1/20 0.33
PKLR P30613 1/20 0.33
RAB9A P51151 1/20 0.33
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
PTGS1 P23219 2/20 0.32
PTGS2 P35354 2/20 0.32
RORC P51449 1/20 0.32
KMT2A Q03164 1/20 0.32
NOX4 Q9NPH5 1/20 0.31
MAPT P10636 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7055556 0.99 HTT (0.38) GAAHTTHSD11B1ALDH1A1KDM4E
SCHEMBL5350460 0.99 GAA (0.37) GAAHTTHSD11B1ALDH1A1KDM4E
SCHEMBL5002053 0.88 MEN1 (0.41) GAAHTTHSD11B1KDM4ECA2
SCHEMBL5433859 0.86 ALDH1A1 (0.35) GAAHTTALDH1A1PKMCA1
Trifluoromethanesulfonic Acid SCHEMBL5353660 0.85 KCNH2 (0.42) GAAHTTHSD11B1ALDH1A1KDM4E
SCHEMBL3164777 0.85 TSHR (0.42) HTTALDH1A1NPC1RAB9ACA1
SCHEMBL5439039 0.84 ALDH1A1 (0.35) GAAHTTALDH1A1PKMCA1
Trifluoromethanesulfonic Acid SCHEMBL7058003 0.84 KCNH2 (0.41) GAAHTTHSD11B1ALDH1A1KDM4E
SCHEMBL7055117 0.84 LMNA (0.37) GAAHSD11B1ALDH1A1KDM4ENPC1
SCHEMBL3164926 0.83 TSHR (0.43) HTTALDH1A1NPC1RAB9ACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20030134227-A1 Cyclic sulfonium and sulfoxonium photoacid generators and photoresists comprising same SHIPLEY COMPANY, LLC 2003-07-17 US disclosed
EP-1308781-A2 Cyclic sulfonium and sulfoxonium photoacid generators and photoresists containing them Shipley Co. L.L.C. (US) 2003-05-07 EP disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed