SCHEMBL5366311

SCHEMBL5366311

CCCCOC(=O)OCC1(C)CC2C=CC1C2

nearest known ligand 0.34

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.34
CYP2C19 P33261 2/20 0.34
ALDH1A1 P00352 1/20 0.33
ELANE P08246 1/20 0.32
ATM Q13315 1/20 0.32
EPHX2 P34913 3/20 0.32
LMNA P02545 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
POLB P06746 1/20 0.31
TSHR P16473 3/20 0.31
TDP1 Q9NUW8 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
HPGD P15428 1/20 0.30
ESR1 P03372 1/20 0.30
CYP1A2 P05177 1/20 0.30
MAPK1 P28482 1/20 0.30
NR1H2 P55055 1/20 0.30
RNASEL Q05823 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5348568 0.92 CYP2D6 (0.35) CYP2D6CYP2C19
SCHEMBL5358484 0.86 ALDH1A1 (0.38) CYP2D6CYP2C19ALDH1A1LMNA
SCHEMBL5355018 0.82 CYP2D6 (0.35) CYP2D6CYP2C19SMN1; SMN2
SCHEMBL5360193 0.80 ELANE (0.35) CYP2D6CYP2C19ALDH1A1ELANEATM
SCHEMBL13025197 0.79 CYP2D6 (0.36) CYP2D6CYP2C19ALDH1A1SMN1; SMN2
SCHEMBL200578 0.77 CYP2C19 (0.36) CYP2D6CYP2C19ALDH1A1ATMEPHX2
SCHEMBL7204575 0.75 CYP2C19 (0.37) CYP2D6CYP2C19ALDH1A1ATMEPHX2
SCHEMBL5356755 0.75 CYP2D6 (0.32) CYP2D6CYP2C19
SCHEMBL7719333 0.75 CYP2D6 (0.38) CYP2D6CYP2C19
SCHEMBL32689139 0.73 EPHX2 (0.38) CYP2D6CYP2C19ALDH1A1EPHX2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed