Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 3/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.33 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 3/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 3/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.32 |
| ▸ | RNASEL | Q05823 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CETP | P11597 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL32689139 | 0.96 | EPHX2 (0.38) | CYP2C19CYP2D6ALDH1A1P2RX7EPHX2 | |
| SCHEMBL201163 | 0.91 | CYP2D6 (0.38) | CYP2C19CYP2D6ALDH1A1P2RX7EPHX2 | |
| SCHEMBL5186809 | 0.89 | P2RX7 (0.34) | CYP2C19CYP2D6P2RX7CETP | |
| SCHEMBL14628487 | 0.85 | P2RX7 (0.36) | CYP2C19CYP2D6ALDH1A1P2RX7CETP | |
| SCHEMBL21593923 | 0.85 | P2RX7 (0.36) | CYP2C19CYP2D6ALDH1A1P2RX7CETP | |
| SCHEMBL4253408 | 0.85 | P2RX7 (0.36) | CYP2C19CYP2D6ALDH1A1P2RX7CETP | |
| SCHEMBL200228 | 0.85 | CYP2C19 (0.40) | CYP2C19CYP2D6P2RX7TSHRLMNA | |
| SCHEMBL7204575 | 0.84 | CYP2C19 (0.37) | CYP2C19CYP2D6ALDH1A1ATMEPHX2 | |
| SCHEMBL294664 | 0.84 | P2RX7 (0.34) | CYP2C19CYP2D6P2RX7CETP | |
| SCHEMBL6747504 | 0.84 | P2RX7 (0.34) | CYP2C19CYP2D6P2RX7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0263425-A1 | A process and composition for metathesis polymerization of cycloolefins | HERCULES INCORPORATED (US) | 1988-04-13 | — | — | EP | claimed |
| CN-119371641-A | Cyclic olefin ring-opening polymer and hydride thereof | 杭州睿丰融创科技有限公司 | 2025-01-28 | — | — | CN | disclosed |
| CN-110366704-B | Radiation-sensitive resin composition and electronic component | 日本瑞翁株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-108885398-B | Radiation-sensitive resin composition and electronic component | 日本瑞翁株式会社 | 2022-11-29 | — | — | CN | disclosed |
| CN-114402258-A | Radiation-sensitive resin composition | 日本瑞翁株式会社 | 2022-04-26 | — | — | CN | disclosed |
| US-11169440-B2 | Radiation-sensitive resin composition and electronic component | ZEON CORPORATION (JP) | 2021-11-09 | — | — | US | disclosed |
| EP-3345970-B1 | RESIN COMPOSITION | ZEON CORP (JP) | 2021-07-28 | — | — | EP | disclosed |
| EP-3434731-B1 | RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | ZEON CORP (JP) | 2021-06-09 | — | — | EP | disclosed |
| CN-108779317-B | Resin composition, resin film, and electronic component | 日本瑞翁株式会社 | 2021-04-16 | — | — | CN | disclosed |
| CN-107922742-B | Resin composition | 日本瑞翁株式会社 | 2021-01-15 | — | — | CN | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-1034196-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-09-13 | — | — | EP | disclosed |
| WO-2000020472-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-04-13 | — | — | WO | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0698620-B1 | Method for preparing modified resins and their applications | MITSUI CHEMICALS INC (JP) | 1998-12-09 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0698620-A1 | Method for preparing modified resins and their applications | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1996-02-28 | — | — | EP | disclosed |
| US-5064919-A | Catalytic RIM of a dicyclopentadiene and a norbornene-type monomer containing an N-substituted cyclic imide group using a molybdenum or tungsten salt and alkylaluminum activator | HERCULES INCORPORATED (US) | 1991-11-12 | — | — | US | disclosed |
| EP-0263425-A1 | A process and composition for metathesis polymerization of cycloolefins | HERCULES INCORPORATED (US) | 1988-04-13 | — | — | EP | disclosed |