SCHEMBL5360846

SCHEMBL5360846

C=C(C)C(=O)OCCN(CCOC(=O)C(=C)C)C(N)=O

nearest known ligand 0.48

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.48
TSHR P16473 3/20 0.47
ALDH1A1 P00352 2/20 0.38
TDP1 Q9NUW8 2/20 0.36
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
CHRM2 P08172 2/20 0.31
CHRM4 P08173 2/20 0.31
CHRM5 P08912 2/20 0.31
CHRM1 P11229 2/20 0.31
CHRM3 P20309 2/20 0.31
CHRNB2 P17787 1/20 0.31
CHRNA4 P43681 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9324299 0.93 THRB (0.43) THRBTSHRALDH1A1TDP1POLB
Succinic Acid SCHEMBL27992782 0.92 THRB (0.42) THRBTSHRALDH1A1TDP1POLB
SCHEMBL9748896 0.92 THRB (0.42) THRBTSHRALDH1A1TDP1POLB
SCHEMBL19951567 0.90 THRB (0.41) THRBTSHRALDH1A1TDP1POLB
SCHEMBL9747740 0.89 THRB (0.44) THRBTSHRALDH1A1POLBCHRM2
SCHEMBL19951568 0.88 THRB (0.42) THRBTSHRALDH1A1TDP1POLB
SCHEMBL19952790 0.87 TSHR (0.41) THRBTSHRALDH1A1TDP1POLB
SCHEMBL19951577 0.87 THRB (0.39) THRBTSHRALDH1A1TDP1POLB
SCHEMBL16159994 0.84 THRB (0.52) THRBTSHRALDH1A1TDP1POLB
SCHEMBL9747580 0.83 L3MBTL1 (0.37) THRBTSHRALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11891472-B2 Composition, production method for composition, and production method for unsaturated compound RESONAC CORPORATION (JP) 2024-02-06 US disclosed
US-20220119585-A1 COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND SHOWA DENKO K.K. (JP) 2022-04-21 US disclosed
EP-3842415-A1 COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND Showa Denko K.K. (JP) 2021-06-30 EP disclosed
US-7282323-B2 Highly heat-resistant, negative-type photosensitive resin composition ASAHI KASEI EMD CORPORATION (JP) 2007-10-16 US disclosed