Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KEAP1 | Q14145 | 1/20 | 0.59 |
| ▸ | ESR1 | P03372 | 2/20 | 0.59 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.59 |
| ▸ | ABAT | P80404 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | SLC28A3 | Q9HAS3 | 1/20 | 0.41 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.41 |
| ▸ | ACHE | P22303 | 1/20 | 0.41 |
| ▸ | SGMS1 | Q86VZ5 | 1/20 | 0.41 |
| ▸ | SGMS2 | Q8NHU3 | 1/20 | 0.41 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21694307 | 0.87 | KEAP1 (0.68) | KEAP1ESR1ESR2ABATKDM4E | |
| SCHEMBL21010900 | 0.86 | KEAP1 (0.50) | KEAP1ESR1ESR2ABATKDM4E | |
| SCHEMBL875676 | 0.83 | BCL2 (0.54) | KEAP1KDM4EMEN1ALDH1A1MAPT | |
| SCHEMBL19038937 | 0.82 | KEAP1 (0.47) | KEAP1ESR1ESR2ABATKDM4E | |
| SCHEMBL8676077 | 0.82 | ERN1 (0.50) | KEAP1ESR1ESR2ABATKDM4E | |
| SCHEMBL574142 | 0.82 | LMNA (0.51) | KEAP1MEN1ALDH1A1MAPTALOX12 | |
| SCHEMBL4814389 | 0.82 | TRPA1 (0.45) | KEAP1ESR1ESR2KDM4EMEN1 | |
| SCHEMBL19039040 | 0.81 | KEAP1 (0.46) | KEAP1ESR1ESR2ABATKDM4E | |
| SCHEMBL18044787 | 0.81 | SLC28A3 (0.61) | KEAP1ESR1ESR2ABATKDM4E | |
| SCHEMBL19038997 | 0.79 | ESR1 (0.56) | KEAP1ESR1ESR2ABATCA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118605082-A | Small molecule composition, photoresist composition and method for forming pattern on substrate | 连云港邃铸科技有限公司 | 2024-09-06 | — | — | CN | disclosed |
| CN-113646052-B | Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument | 百乐墨水株式会社 | 2024-05-17 | — | — | CN | disclosed |
| CN-111919173-B | Positive photosensitive resin composition, cured film thereof, and solid-state imaging device provided with cured film | 东丽株式会社 | 2024-04-02 | — | — | CN | disclosed |
| CN-113253569-B | Small molecule composition, photoresist composition and method for forming pattern on substrate | 上海邃铸科技有限公司 | 2023-10-10 | — | — | CN | disclosed |
| CN-110366768-B | Composition for forming coating film for removing foreign matter | 日产化学株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-113785023-B | Water-based ink composition for reversible thermochromic writing instrument, refill for refill and water-based ballpoint pen incorporating same | 株式会社百乐 | 2023-05-12 | — | — | CN | disclosed |
| CN-113785023-A | Water-based ink composition for reversible thermal discoloration writing instrument, refill containing the same, and water-based ballpoint pen | 株式会社百乐 | 2021-12-10 | — | — | CN | disclosed |
| CN-113646052-A | Reversible thermal discoloration composition, reversible thermal discoloration microcapsule pigment encapsulating the reversible thermal discoloration composition, and writing instrument using the reversible thermal discoloration microcapsule pigment | 百乐墨水株式会社 | 2021-11-12 | — | — | CN | disclosed |
| CN-113253569-A | Small molecule composition, photoresist composition and method for forming pattern on substrate | 上海邃铸科技有限公司 | 2021-08-13 | — | — | CN | disclosed |
| CN-111919173-A | Positive photosensitive resin composition, cured film thereof, and solid-state imaging device provided with cured film | 东丽株式会社 | 2020-11-10 | — | — | CN | disclosed |
| CN-101278239-B | Process for producing substrate with metal wiring | NIPPON ZEON CO | 2011-11-16 | — | — | CN | disclosed |
| CN-100535750-C | Polyamide acid-containing composition for forming antireflective film | NISSAN CHEMICAL IND LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| CN-101278239-A | Process for producing substrate with metal wiring | ZEON CORP (JP) | 2008-10-01 | — | — | CN | disclosed |
| CN-100364160-C | Polymer electrolyte material, polymer electrolyte part, membrane electrode composite and polymer electrolyte type fuel cell | TORAY INDUSTRIES (JP) | 2008-01-23 | — | — | CN | disclosed |
| CN-101065708-A | Method for forming photoresist pattern using double layer antireflection film | NISSAN CHEMICAL IND LTD (JP) | 2007-10-31 | — | — | CN | disclosed |
| US-7163778-B2 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| CN-1842744-A | Polyamic acid-containing composition for forming antireflection film | NISSAN CHEMICAL IND LTD (JP) | 2006-10-04 | — | — | CN | disclosed |
| CN-1226670-C | Photosensitive resin composition and method for improving dry etching resistance of the same | AZ ELECTRONIC MATERIAL CO LTD (JP) | 2005-11-09 | — | — | CN | disclosed |
| US-20040191479-A1 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |
| CN-1316068-A | Photosensitive resin composition and method for improving dry etching resistance of photosensitive resin composition | CLARIANT INT LTD (CH) | 2001-10-03 | — | — | CN | disclosed |