SCHEMBL5369817

SCHEMBL5369817

C[SiH](C)C12CCC(CC1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9230410 0.72
SCHEMBL6026848 0.71 GRIN2D (0.39)
SCHEMBL68868 0.61
SCHEMBL7570194 0.57
SCHEMBL24699888 0.56
SCHEMBL28104 0.56 GRIN2D (0.55)
SCHEMBL891560 0.56
SCHEMBL191884 0.56 GRIN2D (0.41)
SCHEMBL65160 0.56
SCHEMBL191883 0.56 ALDH1A1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070129331-A1 PHARMACEUTICAL COMPOSITIONS AND METHODS OF USE OF LIPOPHILIC, SILICON-SUBSTITUTED, CYCLOOXYGENASE-2 SELECTIVE NON-STEROIDAL ANTI-INFLAMMATORY DRUGS AND DERIVATIVES RND PHARMACEUTICALS, INC. (US) 2007-06-07 US claimed
EP-1737471-A2 PHARMACEUTICAL COMPOSITIONS AND METHODS OF USE OF LIPOPHILIC, SILICON-SUBSTITUTED, CYCLOOXYGENASE-2 SELECTIVE NON-STEROIDAL ANTI-INFLAMMATORY DRUGS AND DERIVATIVES RND Pharmaceuticals (US) 2007-01-03 EP claimed
EP-1558654-A4 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-04-05 EP claimed
WO-2005102358-A2 SILICONE-SUBSTITUTED COX-2 SELECTIVE INHIBITORS RND PHARMACEUTICALS (US) 2005-11-03 WO claimed
EP-1558654-A2 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF Fujifilm Electronic Materials USA, Inc. (US) 2005-08-03 EP claimed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US claimed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US claimed
WO-2004050665-A1 SILICON COMPOUNDS AMEDIS PHARMACEUTICALS LTD. (GB) 2004-06-17 WO claimed
WO-2004050666-A1 SILICON COMPOUNDS USEFUL IN CANCER THERAPY AMEDIS PHARMACEUTICALS LTD. (GB) 2004-06-17 WO claimed
WO-2004040371-A2 NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2004-05-13 WO claimed
US-7081537-B2 Process for the electrophilic substitution of thiazolidines or oxazolidines Consortium für elektrochemische Industrie GmbH (DE) 2006-07-25 US disclosed
US-20060030732-A1 Process for cleaving thiazolidines CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DE) 2006-02-09 US disclosed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US disclosed
US-20040171840-A1 Process for the electrophilic substitution of thiazolidines or oxazolidines CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH 2004-09-02 US disclosed
EP-1452529-A1 PRocess for an electrophilic substitution of thiazolidines or oxazolidines Consortium für elektrochemische Industrie GmbH (DE) 2004-09-01 EP disclosed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US disclosed
WO-2004050665-A1 SILICON COMPOUNDS AMEDIS PHARMACEUTICALS LTD. (GB) 2004-06-17 WO disclosed
US-4957989-A ANTIFOULING AGENT FOR SHIP BOTTOMS, NONTOXIC TOSHIBA SILICONE CO., LTD. (JP) 1990-09-18 US disclosed