SCHEMBL5370477

SCHEMBL5370477

CCOCCn1c(CC)nc2ccccc21

nearest known ligand 0.71

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.71
ALDH1A1 P00352 1/20 0.71
MEN1 O00255 1/20 0.71
KMT2A Q03164 1/20 0.71
SMN1; SMN2 Q16637 3/20 0.67
LMNA P02545 1/20 0.67
RAB9A P51151 1/20 0.67
KDM4E B2RXH2 2/20 0.66
MAPK1 P28482 2/20 0.62
RECQL P46063 1/20 0.62
TP53 P04637 2/20 0.59
MAPT P10636 2/20 0.59
HSD17B10 Q99714 1/20 0.59
GAA P10253 1/20 0.59
ATM Q13315 1/20 0.58
L3MBTL1 Q9Y468 1/20 0.58
POLB P06746 1/20 0.57
HPGD P15428 1/20 0.56
HRH1 P35367 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1520758 0.88 ALDH1A1 (0.76) TSHRALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL7497251 0.88 MEN1 (0.68) TSHRALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL5372898 0.87 SMN1; SMN2 (0.71) TSHRALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL30062763 0.87 TSHR (0.58) TSHRALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL28566828 0.87 TSHR (0.58) TSHRALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL5379370 0.86 TSHR (0.65) TSHRALDH1A1KMT2ASMN1; SMN2LMNA
Hydrochloric Acid SCHEMBL9635893 0.85 ALDH1A1 (0.71) TSHRALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL9518762 0.84 ALDH1A1 (0.70) TSHRALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL5373120 0.83 KDM4E (0.72) TSHRALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL8319438 0.83 TSHR (0.72) TSHRALDH1A1MEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-20050095533-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-05 US disclosed