SCHEMBL5372898

SCHEMBL5372898

CCc1nc2ccccc2n1CCOCCOC

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.71
RAB9A P51151 4/20 0.60
ALDH1A1 P00352 2/20 0.60
NPC1 O15118 2/20 0.60
KDM4E B2RXH2 1/20 0.60
PKM P14618 1/20 0.60
NFKB1 P19838 1/20 0.60
NFKB2 Q00653 1/20 0.60
RELA Q04206 1/20 0.60
MAPK1 P28482 2/20 0.60
POLB P06746 1/20 0.60
TP53 P04637 3/20 0.58
MAPT P10636 3/20 0.58
GAA P10253 1/20 0.58
TSHR P16473 5/20 0.58
RECQL P46063 1/20 0.58
L3MBTL1 Q9Y468 3/20 0.58
ATM Q13315 1/20 0.58
KMT2A Q03164 2/20 0.56
MEN1 O00255 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5379370 0.91 TSHR (0.65) SMN1; SMN2RAB9AALDH1A1NPC1KDM4E
SCHEMBL5370477 0.87 TSHR (0.71) SMN1; SMN2RAB9AALDH1A1KDM4EMAPK1
SCHEMBL30062763 0.86 TSHR (0.58) SMN1; SMN2RAB9AALDH1A1KDM4EMAPK1
SCHEMBL28566828 0.86 TSHR (0.58) SMN1; SMN2RAB9AALDH1A1KDM4EMAPK1
Hydrochloric Acid SCHEMBL29205417 0.84 SMN1; SMN2 (0.72) SMN1; SMN2RAB9AALDH1A1NPC1KDM4E
Hydrochloric Acid SCHEMBL30281588 0.84 SMN1; SMN2 (0.72) SMN1; SMN2RAB9AALDH1A1NPC1KDM4E
SCHEMBL5371056 0.83 SMN1; SMN2 (0.63) SMN1; SMN2RAB9AALDH1A1NPC1KDM4E
SCHEMBL5374092 0.83 SMN1; SMN2 (0.63) SMN1; SMN2RAB9AALDH1A1NPC1KDM4E
SCHEMBL5377374 0.83 SMN1; SMN2 (0.63) SMN1; SMN2RAB9AALDH1A1NPC1KDM4E
SCHEMBL5381431 0.83 SMN1; SMN2 (0.63) SMN1; SMN2RAB9AALDH1A1NPC1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-7252925-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-07 US disclosed
US-20050095533-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-05 US disclosed