SCHEMBL5376029

SCHEMBL5376029

O=S(=O)(O)c1cc2c3c(cccc3c1)C=C2

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.39
▸ TSHR P16473 3/20 0.39
▸ HSD17B10 Q99714 3/20 0.39
▸ TDP1 Q9NUW8 2/20 0.39
▸ NT5E P21589 2/20 0.39
▸ MAPK1 P28482 2/20 0.39
▸ CASP6 P55212 4/20 0.38
▸ CYP2C9 P11712 3/20 0.38
▸ CYP2C19 P33261 2/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.38
▸ DUSP5 Q16690 1/20 0.37
▸ SNCA P37840 2/20 0.36
▸ NSD2 O96028 2/20 0.36
▸ DUSP3 P51452 2/20 0.36
▸ PTPN5 P54829 2/20 0.36
▸ PTPN11 Q06124 2/20 0.36
▸ APEX1 P27695 1/20 0.35
▸ CYP1A2 P05177 2/20 0.35
▸ DNASE1L3 Q13609 1/20 0.35
▸ HIF1A Q16665 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5001925 0.79 KMT2A (0.50) ALDH1A1TSHRHSD17B10TDP1NT5E
Hydrochloric Acid SCHEMBL27830343 0.77 ALDH1A1 (0.34) ALDH1A1TSHRHSD17B10TDP1NT5E
SCHEMBL3827398 0.75 ALDH1A1 (0.55) ALDH1A1TSHRHSD17B10TDP1NT5E
SCHEMBL27636239 0.73 ALDH1A1 (0.48) ALDH1A1TSHRHSD17B10TDP1NT5E
Ammonia Solution, Strong SCHEMBL11319530 0.73 KLK7 (0.45) ALDH1A1TSHRHSD17B10TDP1NT5E
SCHEMBL423301 0.73 NT5E (0.56) ALDH1A1TSHRHSD17B10TDP1NT5E
SCHEMBL5171487 0.73 ALDH1A1 (0.51) ALDH1A1TSHRHSD17B10TDP1NT5E
SCHEMBL5637719 0.71 NT5E (0.54) ALDH1A1TSHRHSD17B10TDP1NT5E
SCHEMBL10905229 0.71 NT5E (0.54) ALDH1A1TSHRHSD17B10TDP1NT5E
SCHEMBL27759998 0.71 ALDH1A1 (0.34) ALDH1A1TSHRHSD17B10TDP1NT5E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 — — US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 — — US disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 — — US disclosed
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