Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.48 |
| ▸ | TSHR | P16473 | 4/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.48 |
| ▸ | CYP1A1 | P04798 | 2/20 | 0.48 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.47 |
| ▸ | CASP6 | P55212 | 3/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.45 |
| ▸ | NT5E | P21589 | 2/20 | 0.44 |
| ▸ | SNCA | P37840 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | SUMO2 | P61956 | 1/20 | 0.44 |
| ▸ | SUMO1 | P63165 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27636239 | 0.84 | ALDH1A1 (0.48) | KMT2AALDH1A1MAPK1HSD17B10TSHR | |
| Pyrene SCHEMBL5720270 | 0.81 | ALDH1A1 (0.65) | KMT2AMEN1ALDH1A1MAPK1HSD17B10 | |
| SCHEMBL423301 | 0.80 | NT5E (0.56) | KMT2AMEN1ALDH1A1MAPK1HSD17B10 | |
| Ammonia Solution, Strong SCHEMBL11319530 | 0.80 | KLK7 (0.45) | KMT2AMEN1ALDH1A1MAPK1HSD17B10 | |
| SCHEMBL5171487 | 0.80 | ALDH1A1 (0.51) | KMT2AMEN1ALDH1A1MAPK1HSD17B10 | |
| SCHEMBL27449004 | 0.80 | CYP2C9 (0.47) | KMT2AMEN1ALDH1A1MAPK1HSD17B10 | |
| SCHEMBL3827398 | 0.79 | ALDH1A1 (0.55) | KMT2AMEN1ALDH1A1MAPK1HSD17B10 | |
| SCHEMBL10905229 | 0.79 | NT5E (0.54) | KMT2AMEN1ALDH1A1MAPK1HSD17B10 | |
| SCHEMBL5376029 | 0.79 | ALDH1A1 (0.39) | ALDH1A1MAPK1HSD17B10TSHRCYP1A2 | |
| SCHEMBL5637719 | 0.79 | NT5E (0.54) | KMT2AMEN1ALDH1A1MAPK1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5250385-A | Photosensitivity, storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | claimed |
| US-5202216-A | Containing water insoluble polymer and aromatic sulfonic acid salt of an onium compound | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-13 | — | — | US | claimed |
| US-20230184715-A1 | METHOD FOR ION/ION REACTION FOR ION MOBILITY MASS SPECTROSCOPY | NATIONAL INSTITUTES OF HEALTH | 2023-06-15 | — | — | US | disclosed |
| US-20210382390-A1 | NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST | MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) | 2021-12-09 | — | — | US | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-7776512-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20090148791-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7544461-B2 | Near infrared ray activation type positive resin composition | KANSAI PAINT CO., LTD. (JP) | 2009-06-09 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| CN-1738813-A | Sulfonium salt compound, radiation-sensitive acid generator, and positive-type radiation-sensitive resin composition | JSR CORP (JP) | 2006-02-22 | — | — | CN | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-5250385-A | Photosensitivity, storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| US-5202216-A | Containing water insoluble polymer and aromatic sulfonic acid salt of an onium compound | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | RARA, SUN2, RARG | KMT2A 1992/4885MEN1 3334/4885ALDH1A1 2704/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.