SCHEMBL538076

SCHEMBL538076

O=C(CS)OCC(CO)(CO)COC(=O)CS

nearest known ligand 0.43

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.43
TP53 P04637 1/20 0.43
CYP3A4 P08684 1/20 0.43
MAPK1 P28482 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
HIF1A Q16665 1/20 0.43
TSHR P16473 1/20 0.39
HSD17B10 Q99714 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL538388 0.95 ALDH1A1 (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL331392 0.95 ALDH1A1 (0.48) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL11586781 0.94 ALDH1A1 (0.39) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL31483844 0.92 ALDH1A1 (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL6679883 0.89 ALDH1A1 (0.44) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL60561 0.87 TSHR (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL538874 0.87 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL4820921 0.87 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL31483866 0.87 ALDH1A1 (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL13265138 0.86 ALDH1A1 (0.41) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119709079-A Low-temperature curing epoxy adhesive and preparation method thereof 亿铖达(深圳)新材料有限公司 2025-03-28 CN claimed
US-12359016-B2 Method of preparing low haze polymer compositions for use in high refractive index optical materials PPG INDUSTRIES OHIO, INC. (US) 2025-07-15 US disclosed
CN-119709079-A Low-temperature curing epoxy adhesive and preparation method thereof 亿铖达(深圳)新材料有限公司 2025-03-28 CN disclosed
CN-118795731-B Quantum dot photoresist for manufacturing high-resolution pixels 南京理工大学 2024-12-03 CN disclosed
CN-118795731-A Quantum dot photoresist for manufacturing high-resolution pixels 南京理工大学 2024-10-18 CN disclosed
EP-3325532-B1 COMPOSITION FOR PREPARING MOLDED POLYMERIC ARTICLE PPG IND OHIO INC (US) 2024-09-04 EP disclosed
US-11840599-B2 Thiol-containing composition for optical material and polymerizable composition for optical material MITSUI CHEMICALS, INC. (JP) 2023-12-12 US disclosed
CN-115335425-B Method for preparing low haze polymer compositions for high refractive index optical materials PPG工业俄亥俄公司 2023-10-24 CN disclosed
US-11795331-B2 Curable photochromic compositions TRANSITIONS OPTICAL, INC. (US) 2023-10-24 US disclosed
CN-115181347-B High-strength self-repairing elastomer material and preparation method thereof 四川大学 2023-05-26 CN disclosed
US-20040254258-A1 Polymerizable composition, optical material comprising the composition and method for producing the material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-12-16 US disclosed
US-20040138401-A1 High impact poly (urethane urea) polysulfides PPG INDUSTRIES OHIO, INC. 2004-07-15 US disclosed
WO-2004011506-A1 A HIGH REFRACTIVE INDEX POLYMERIZABLE COMPOSITION PPG INDUSTRIES OHIO, INC. (US) 2004-02-05 WO disclosed
US-20040021133-A1 High refractive index polymerizable composition PPG INDUSTRIES OHIO, INC. 2004-02-05 US disclosed
US-20030149217-A1 High impact poly (urethane urea) polysulfides PPG INDUSTRIES OHIO, INC. 2003-08-07 US disclosed
US-5942158-A PHOTOCHROMIC ARTICLE PPG INDUSTRIES OHIO, INC. (US) 1999-08-24 US disclosed
US-5932681-A PHOTOCHROMIC ARTICLE PPG INDUSTRIES OHIO, INC. (US) 1999-08-03 US disclosed
US-5767212-A RADICALLY POLYMERIZING ACRYLATE MONOMER CONTAINING SULFUR TORAY INDUSTRIES, INC. (JP) 1998-06-16 US disclosed
EP-0609454-B1 PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER TORAY INDUSTRIES (JP) 1997-10-22 EP disclosed
EP-0609454-A1 PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER TORAY INDUSTRIES, INC. (JP) 1994-08-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11840599-B2 Thiol-containing composition for optical material and polymerizable composition for optical material C5, EPB41L2, EPB41 ALDH1A1 646/4885TP53 4326/4885CYP3A4 801/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.