Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.89 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | TTR | P02766 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrahydrofuran SCHEMBL1724146 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| Tetrahydrofuran SCHEMBL11026489 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| Cyclopropane SCHEMBL3744694 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| SCHEMBL2846103 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| SCHEMBL4788259 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| SCHEMBL2848269 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| SCHEMBL2845030 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| SCHEMBL10713952 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| SCHEMBL87670 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A | |
| SCHEMBL4456224 | 1.00 | ALDH1A1 (0.89) | ALDH1A1TSHRTTRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7270937-B2 | Over-coating composition for photoresist and process for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-09-18 | — | — | US | disclosed |
| US-20050084795-A1 | Over-coating composition for photoresist and process for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-04-21 | — | — | US | disclosed |