SCHEMBL5403685

SCHEMBL5403685

CCc1ccc([I+](OS(=O)(=O)c2cccc(F)c2)c2ccc(CC)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.38
POLB P06746 1/20 0.38
ALDH1A1 P00352 3/20 0.35
HTR6 P50406 1/20 0.35
CA2 P00918 1/20 0.35
MAPT P10636 3/20 0.35
KDM4E B2RXH2 1/20 0.35
F2 P00734 1/20 0.35
VDR P11473 1/20 0.35
L3MBTL1 Q9Y468 2/20 0.34
MEN1 O00255 1/20 0.34
TP53 P04637 1/20 0.34
THRB P10828 1/20 0.34
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
HCRTR2 O43614 1/20 0.33
PGR P06401 1/20 0.33
PTGDR Q13258 1/20 0.33
PTGDR2 Q9Y5Y4 1/20 0.33
TAS2R14 Q9NYV8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5413752 0.90 CA2 (0.38) KMT2APOLBALDH1A1HTR6CA2
SCHEMBL5401602 0.85 HCRTR2 (0.40) KMT2AALDH1A1HTR6CA2MEN1
SCHEMBL5398585 0.83 MAPT (0.43) POLBALDH1A1HTR6CA2MAPT
SCHEMBL5413753 0.83 ALDH1A1 (0.43) POLBALDH1A1CA2MAPTKDM4E
SCHEMBL5419138 0.83 PGR (0.43) KMT2AHTR6CA2MAPTL3MBTL1
SCHEMBL5410042 0.82 NPC1 (0.35) KMT2APOLBALDH1A1HTR6MAPT
SCHEMBL5412396 0.81 PTGER2 (0.37) ALDH1A1HTR6CA2NPC1RAB9A
SCHEMBL5409946 0.81 ALDH1A1 (0.40) KMT2AALDH1A1HTR6KDM4EMEN1
SCHEMBL5398390 0.80 KMT2A (0.48) KMT2APOLBALDH1A1CA2MAPT
SCHEMBL5398357 0.76 FFAR4 (0.38) KMT2AALDH1A1CA2MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed