SCHEMBL5406922

SCHEMBL5406922

CCc1ccc([I+](OS(=O)(=O)c2ccc(F)cc2F)c2ccc(CC)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.38
POLB P06746 1/20 0.37
CTDSP1 Q9GZU7 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
HTR6 P50406 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.34
KCNH2 Q12809 1/20 0.34
CXCR4 P61073 1/20 0.34
LMNA P02545 1/20 0.34
ALDH1A1 P00352 4/20 0.34
CCR2 P41597 2/20 0.33
KDM2B Q8NHM5 1/20 0.33
KAT6A Q92794 1/20 0.33
MAPT P10636 2/20 0.33
KDM4E B2RXH2 2/20 0.33
AKR1B1 P15121 1/20 0.33
F2 P00734 1/20 0.32
VDR P11473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5403591 0.90 HTR2A (0.35) GAATDP1HTR6CXCR4LMNA
SCHEMBL5403488 0.85 HTT (0.38) SMN1; SMN2KCNH2ALDH1A1CCR2KAT6A
SCHEMBL5422314 0.83 KAT6A (0.38) GAATDP1LMNAALDH1A1KAT6A
SCHEMBL5398691 0.83 NPC1 (0.35) POLBSMN1; SMN2KCNH2LMNAALDH1A1
SCHEMBL503804 0.82 GAA (0.39) GAASMN1; SMN2KCNH2ALDH1A1CCR2
SCHEMBL548575 0.81 KMT2A (0.38) GAAPOLBSMN1; SMN2KCNH2ALDH1A1
SCHEMBL5403656 0.81 MAPT (0.37) POLBSMN1; SMN2KCNH2LMNAALDH1A1
SCHEMBL5413753 0.80 ALDH1A1 (0.43) GAAPOLBSMN1; SMN2LMNAALDH1A1
SCHEMBL5403685 0.78 KMT2A (0.38) POLBHTR6SMN1; SMN2LMNAALDH1A1
SCHEMBL5403649 0.76 TP53 (0.41) GAAPOLBLMNAALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed