SCHEMBL5403656

SCHEMBL5403656

CC(C)c1ccc([I+](OS(=O)(=O)c2ccc(F)cc2F)c2ccc(C(C)C)cc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.37
CCR2 P41597 2/20 0.35
ALDH1A1 P00352 2/20 0.33
PSEN1 P49768 3/20 0.33
PSEN2 P49810 3/20 0.33
APH1B Q8WW43 3/20 0.33
NCSTN Q92542 3/20 0.33
APH1A Q96BI3 3/20 0.33
PSENEN Q9NZ42 3/20 0.33
AKR1B1 P15121 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
KCNH2 Q12809 1/20 0.32
TP53 P04637 1/20 0.32
PER2 O15055 1/20 0.32
CRY1 Q16526 1/20 0.32
CRY2 Q49AN0 1/20 0.32
AGBL2 Q5U5Z8 1/20 0.32
TRPV4 Q9HBA0 1/20 0.31
POLB P06746 2/20 0.31
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5403488 0.85 HTT (0.38) MAPTCCR2ALDH1A1AKR1B1SMN1; SMN2
SCHEMBL5404365 0.83 CNR2 (0.39) MAPTALDH1A1SMN1; SMN2LMNA
SCHEMBL503804 0.82 GAA (0.39) MAPTCCR2ALDH1A1AKR1B1SMN1; SMN2
SCHEMBL548575 0.81 KMT2A (0.38) CCR2ALDH1A1AKR1B1SMN1; SMN2KCNH2
SCHEMBL5406922 0.81 GAA (0.38) MAPTCCR2ALDH1A1AKR1B1SMN1; SMN2
SCHEMBL5408480 0.80 LMNA (0.41) MAPTALDH1A1PSEN1PSEN2APH1B
SCHEMBL5403591 0.79 HTR2A (0.35) MAPTALDH1A1PER2CRY1CRY2
SCHEMBL5409946 0.78 ALDH1A1 (0.40) ALDH1A1KCNH2
SCHEMBL5398691 0.78 NPC1 (0.35) MAPTCCR2ALDH1A1AKR1B1SMN1; SMN2
SCHEMBL5401430 0.77 RAB9A (0.38) MAPTALDH1A1TP53LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed