SCHEMBL5406934

SCHEMBL5406934

CC(C)(C)c1ccc([I+](OS(=O)(=O)c2cc([N+](=O)[O-])cc([N+](=O)[O-])c2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 5/20 0.40
ALDH1A1 P00352 5/20 0.37
SMN1; SMN2 Q16637 4/20 0.36
KMT2A Q03164 4/20 0.36
LMNA P02545 3/20 0.36
MAPT P10636 3/20 0.36
RAB9A P51151 3/20 0.36
MEN1 O00255 3/20 0.36
NPC1 O15118 2/20 0.36
NFKB1 P19838 1/20 0.36
NFKB2 Q00653 1/20 0.36
RELA Q04206 1/20 0.36
HTT P42858 4/20 0.36
GAA P10253 2/20 0.36
HPGD P15428 1/20 0.36
NPBWR1 P48145 1/20 0.35
GALR3 O60755 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
HSD17B3 P37058 1/20 0.35
HSD17B2 P37059 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5398592 0.89 HSD11B1 (0.47) HSD11B1ALDH1A1SMN1; SMN2KMT2ALMNA
SCHEMBL5408367 0.89 KMT2A (0.48) ALDH1A1SMN1; SMN2KMT2ALMNAMAPT
SCHEMBL5400383 0.88 POLB (0.35) HSD11B1ALDH1A1SMN1; SMN2KMT2ALMNA
SCHEMBL5408954 0.85 ACHE (0.43) ALDH1A1KMT2ALMNAMAPTRAB9A
SCHEMBL5412310 0.82 HTT (0.42) ALDH1A1SMN1; SMN2KMT2AMAPTMEN1
SCHEMBL5409187 0.82 CYP19A1 (0.38) ALDH1A1SMN1; SMN2KMT2ALMNAMAPT
SCHEMBL5415038 0.80 ALOX5 (0.40) MAPTHTTNPBWR1ALOX5
SCHEMBL51291 0.77 TSHR (0.47) HSD11B1ALDH1A1SMN1; SMN2KMT2ALMNA
SCHEMBL5405588 0.77 PRMT5 (0.44) ALDH1A1SMN1; SMN2KMT2ALMNAMAPT
SCHEMBL5415919 0.77 FFAR1 (0.38) HSD11B1ALDH1A1KMT2AMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed