Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 4/20 | 0.36 |
| ▸ | CA2 | P00918 | 4/20 | 0.36 |
| ▸ | BCHE | P06276 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8083696 | 0.94 | CA1 (0.35) | CA1CA2HSD11B1CA12CA7 | |
| SCHEMBL2903713 | 0.94 | CA1 (0.35) | CA1CA2HSD11B1CA12CA7 | |
| SCHEMBL8646200 | 0.91 | ALDH1A1 (0.33) | CA1CA2CA12CA9ALDH1A1 | |
| SCHEMBL8647722 | 0.91 | ALDH1A1 (0.33) | CA1CA2CA12CA9ALDH1A1 | |
| SCHEMBL3206290 | 0.84 | CA12 (0.33) | CA1CA2HSD11B1CA12CA7 | |
| SCHEMBL8646184 | 0.83 | ALDH1A1 (0.41) | CA1CA2HSD11B1CA12CA7 | |
| SCHEMBL8651808 | 0.83 | PTGES2 (0.34) | CA1CA2CA12CA7 | |
| SCHEMBL2895868 | 0.83 | PKM (0.48) | CA1CA2HSD11B1CA12CA7 | |
| SCHEMBL6760272 | 0.83 | PTGES2 (0.36) | CA1CA2CA12CA7ALDH1A1 | |
| SCHEMBL5412880 | 0.81 | ALDH1A1 (0.44) | CA1CA2BCHEACHEHSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |
| US-20030017425-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-01-23 | — | — | US | disclosed |
| US-6106993-A | HIGHLY SENSITIVE TO ACTINIC RADIATION SUCH AS DEEP-UV, ELECTRON BEAM AND X-RAY, CAN BE DEVELOPED WITH ALKALINE AQUEOUS SOLUTION TO FORM A PATTERN, AND IS THUS SUITABLE FOR USE IN A FINE PATTERNING TECHNIQUE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-22 | — | — | US | disclosed |
| US-5824824-A | AROMATIC SULFONATE ANIONS AND DISSOLUTION CONTRAST IN EXPOSED AND NONEXPOSED AREAS, POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-10-20 | — | — | US | disclosed |