SCHEMBL5408475

SCHEMBL5408475

CC(C)c1ccc([I+]c2ccc(C(C)C)cc2)cc1.O=S(=O)([O-])c1ccc(F)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
MCOLN3 Q8TDD5 1/20 0.41
GPR183 P32249 1/20 0.38
ALDH1A1 P00352 2/20 0.38
MAPT P10636 2/20 0.38
KDM4E B2RXH2 1/20 0.38
GAA P10253 1/20 0.38
CA1 P00915 2/20 0.37
CA2 P00918 2/20 0.37
MALT1 Q9UDY8 1/20 0.36
KAT6A Q92794 1/20 0.35
CA12 O43570 1/20 0.35
CA9 Q16790 1/20 0.35
PKM P14618 1/20 0.35
HTR2A P28223 1/20 0.35
HTR2C P28335 1/20 0.35
HTR6 P50406 1/20 0.34
PSEN1 P49768 1/20 0.34
PSEN2 P49810 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29364739 0.85 ACHE (0.48) LMNASMN1; SMN2MCOLN3ALDH1A1MAPT
SCHEMBL5409943 0.84 ALDH1A1 (0.43) LMNASMN1; SMN2MCOLN3ALDH1A1MAPT
SCHEMBL5422183 0.83 CA1 (0.41) LMNAMCOLN3ALDH1A1MAPTKDM4E
SCHEMBL5382700 0.81 ACHE (0.46) LMNAALDH1A1GAACA1CA2
Toliodium SCHEMBL5400817 0.81 ACHE (0.46) LMNAALDH1A1GAACA1CA2
SCHEMBL5403652 0.81 PSEN1 (0.36) LMNASMN1; SMN2MCOLN3ALDH1A1MAPT
SCHEMBL7896687 0.81 MCOLN3 (0.45) LMNASMN1; SMN2MCOLN3ALDH1A1MAPT
SCHEMBL5408665 0.81 MCOLN3 (0.38) LMNASMN1; SMN2MCOLN3GPR183ALDH1A1
SCHEMBL5403550 0.80 CA1 (0.43) LMNASMN1; SMN2MCOLN3ALDH1A1MAPT
SCHEMBL5153019 0.78 ALDH1A1 (0.50) LMNASMN1; SMN2MCOLN3ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed