SCHEMBL5403652

SCHEMBL5403652

CC(C)c1ccc([I+]c2ccc(C(C)C)cc2)cc1.O=S(=O)([O-])c1ccc(F)cc1F

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSEN1 P49768 4/20 0.36
PSEN2 P49810 4/20 0.36
APH1B Q8WW43 4/20 0.36
NCSTN Q92542 4/20 0.36
APH1A Q96BI3 4/20 0.36
PSENEN Q9NZ42 4/20 0.36
CCR2 P41597 2/20 0.36
MCOLN3 Q8TDD5 1/20 0.34
LMNA P02545 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
MAPT P10636 3/20 0.34
HTR6 P50406 1/20 0.34
ALDH1A1 P00352 2/20 0.33
GAA P10253 1/20 0.33
TSHR P16473 1/20 0.33
AKR1B1 P15121 1/20 0.33
CNR1 P21554 2/20 0.32
CNR2 P34972 1/20 0.32
PER2 O15055 1/20 0.32
CRY1 Q16526 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Toliodium SCHEMBL5403487 0.84 MAPT (0.38) CCR2SMN1; SMN2MAPTALDH1A1AKR1B1
SCHEMBL5404363 0.83 CNR2 (0.45) MCOLN3CNR1CNR2
SCHEMBL503803 0.82 GAA (0.40) CCR2SMN1; SMN2MAPTALDH1A1GAA
SCHEMBL30827110 0.82 GAA (0.40) CCR2SMN1; SMN2MAPTALDH1A1GAA
SCHEMBL5408475 0.81 LMNA (0.43) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL30113133 0.81 HTR2A (0.38) CCR2SMN1; SMN2MAPTALDH1A1TSHR
SCHEMBL548574 0.81 HTR2A (0.38) CCR2SMN1; SMN2MAPTALDH1A1TSHR
SCHEMBL5406919 0.81 GAA (0.39) CCR2LMNASMN1; SMN2MAPTHTR6
SCHEMBL3181701 0.79 KAT6A (0.34) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL4859182 0.79 LMNA (0.40) CCR2LMNAMAPTALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed