Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.31 |
| ▸ | CA2 | P00918 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | TYR | P14679 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1800655 | 0.82 | CA1 (0.33) | CA1CA2ALDH1A1 | |
| SCHEMBL2902231 | 0.82 | CA1 (0.33) | CA1CA2GAAMAPT | |
| SCHEMBL5408480 | 0.80 | LMNA (0.41) | CA1CA2KDM4EALDH1A1LMNA | |
| SCHEMBL503664 | 0.78 | CA1 (0.38) | CA1CA2 | |
| SCHEMBL503801 | 0.78 | HDAC11 (0.37) | CA1CA2ALDH1A1LMNAGAA | |
| SCHEMBL5409951 | 0.78 | CA2 (0.40) | CA1CA2KDM4EALDH1A1LMNA | |
| SCHEMBL5404365 | 0.78 | CNR2 (0.39) | ALDH1A1LMNAMAPT | |
| SCHEMBL7896688 | 0.76 | TYR (0.36) | CA1CA2KDM4EALDH1A1LMNA | |
| SCHEMBL1803566 | 0.76 | CA1 (0.38) | CA1CA2 | |
| SCHEMBL5411400 | 0.76 | CA2 (0.43) | CA1CA2ALDH1A1LMNAGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |