SCHEMBL503801

SCHEMBL503801

CC(C)(C)c1ccc([I+](OS(=O)(=O)c2c(F)c(F)c(F)c(F)c2F)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC11 Q96DB2 1/20 0.37
HDAC8 Q9BY41 1/20 0.37
HDAC6 Q9UBN7 1/20 0.37
CA1 P00915 4/20 0.37
CA2 P00918 4/20 0.37
CA9 Q16790 2/20 0.37
ALDH1A1 P00352 7/20 0.36
HSD11B1 P28845 3/20 0.33
HSD17B3 P37058 1/20 0.33
MAPT P10636 4/20 0.32
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
CYP1A2 P05177 2/20 0.32
CYP3A4 P08684 2/20 0.32
CYP2C19 P33261 2/20 0.32
NPC1 O15118 2/20 0.32
MAPK1 P28482 2/20 0.32
RAB9A P51151 2/20 0.32
HPGD P15428 1/20 0.32
HTT P42858 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1803566 0.86 CA1 (0.38) HDAC6CA1CA2CA9KMT2A
SCHEMBL4389993 0.85 NPC1 (0.38) HDAC11HDAC8HDAC6CA1CA2
SCHEMBL2902231 0.82 CA1 (0.33) HDAC11HDAC8HDAC6CA1CA2
SCHEMBL2961941 0.80 HSD11B1 (0.44) CA1CA2CA9ALDH1A1HSD11B1
SCHEMBL2966142 0.79 HSD11B1 (0.41) CA1CA2CA9ALDH1A1HSD11B1
SCHEMBL1800655 0.79 CA1 (0.33) CA1CA2CA9ALDH1A1MEN1
SCHEMBL503664 0.78 CA1 (0.38) CA1CA2
SCHEMBL5408671 0.78 CA1 (0.31) CA1CA2ALDH1A1MAPTGAA
SCHEMBL5409951 0.78 CA2 (0.40) HDAC11HDAC8HDAC6CA1CA2
SCHEMBL503481 0.77 ALDH1A1 (0.42) CA1CA2CA9ALDH1A1HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9200098-B2 Radiation-sensitive composition and compound JSR CORPORATION (JP) 2015-12-01 US disclosed
US-9023584-B2 Radiation-sensitive composition, and compound JSR CORPORATION (JP) 2015-05-05 US disclosed
US-20140193752-A1 STABILIZED ACID AMPLIFIERS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2014-07-10 US disclosed
US-20140087309-A1 OLEFIN-TRIGGERED ACID AMPLIFIERS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2014-03-27 US disclosed
US-20130280658-A1 RADIATION-SENSITIVE COMPOSITION, AND COMPOUND JSR CORPORATION (JP) 2013-10-24 US disclosed
US-8501382-B1 Acid amplifiers THE RESEARCH FOUNDATION OF STATE UNIV. OF NEW YORK (US) 2013-08-06 US disclosed
US-8435718-B2 Upper layer-forming composition and photoresist patterning method JSR CORPORATION (JP) 2013-05-07 US disclosed
WO-2012135286-A2 STABILIZED ACID AMPLIFIERS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2012-10-04 WO disclosed
WO-2012135278-A2 OLEFIN-TRIGGERED ACID AMPLIFIERS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2012-10-04 WO disclosed
US-20120164582-A1 RADIATION-SENSITIVE COMPOSITION AND COMPOUND JSR CORPORATION (JP) 2012-06-28 US disclosed
US-20030113658-A1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR CORPORATION (JP) 2003-06-19 US disclosed
US-20030022095-A1 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2003-01-30 US disclosed
EP-1270553-A2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR Corporation (JP) 2003-01-02 EP disclosed
US-20020192593-A1 Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure JSR CORPORATION (JP) 2002-12-19 US disclosed
US-20020172885-A1 Novel carbazole derivative and chemically amplified radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-21 US disclosed
EP-1253470-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-10-30 EP disclosed
EP-1238972-A1 Novel carbazole derivative and chemically amplified radiation-sensitive resin composition JSR Corporation (JP) 2002-09-11 EP disclosed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP disclosed
US-20010038971-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-11-08 US disclosed
US-20010033994-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-10-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020172885-A1 Novel carbazole derivative and chemically amplified radiation-sensitive resin composition ARID2, RAD1, RAD51 HDAC11 372/4885HDAC8 1450/4885HDAC6 1328/4885
US-20140087309-A1 OLEFIN-TRIGGERED ACID AMPLIFIERS ELOVL1, ALOX12, ALOX5 HDAC11 4753/4885HDAC8 4503/4885HDAC6 4805/4885
US-20120164582-A1 RADIATION-SENSITIVE COMPOSITION AND COMPOUND RAD51, RER1, ATP6AP1 HDAC11 1166/4885HDAC8 3883/4885HDAC6 3081/4885
US-20030113658-A1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition ASIC1, PFAS, RARA HDAC11 4366/4885HDAC8 4477/4885HDAC6 2824/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.