SCHEMBL5408943

SCHEMBL5408943

C[C](C)C1CC2C3CCC(C3)C2C1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9880988 0.79 HSD11B1 (0.39) HSD11B1
SCHEMBL5399796 0.75
SCHEMBL5411614 0.72 HSD11B1 (0.31) HSD11B1
SCHEMBL9537843 0.71
SCHEMBL10035494 0.70 MEN1 (0.41) HSD11B1
SCHEMBL24278796 0.69 HSD11B1 (0.33) HSD11B1
SCHEMBL25796571 0.69 HSD11B1 (0.33) HSD11B1
SCHEMBL24282190 0.69 HSD11B1 (0.33) HSD11B1
SCHEMBL1154933 0.68 HSD11B1 (0.31) HSD11B1
SCHEMBL4924106 0.67 LMNA (0.33) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed