SCHEMBL9880988

SCHEMBL9880988

CC(=O)C1CC2C3CCC(C3)C2C1

nearest known ligand 0.39

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5408943 0.79 HSD11B1 (0.33) HSD11B1
SCHEMBL10035494 0.77 MEN1 (0.41) HSD11B1
SCHEMBL17776272 0.74 LMNA (0.36)
SCHEMBL13165892 0.74 LMNA (0.36)
SCHEMBL24943478 0.74 CHRNB2 (0.39)
SCHEMBL19263877 0.74 CHRNB2 (0.39)
SCHEMBL16375429 0.73 RAB9A (0.32) HSD11B1
SCHEMBL16337531 0.73 RAB9A (0.32) HSD11B1
SCHEMBL14336925 0.73 MAPT (0.33)
SCHEMBL17972953 0.72 GABRR1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1091248-B1 Postive-working resist composition FUJIFILM CORP (JP) 2012-05-30 EP disclosed
US-7179579-B2 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-7179579-B2 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed