Toliodium

Toliodium

SCHEMBL5408948

Cc1ccc([I+]c2ccc(C)cc2)cc1.O=[N+]([O-])c1cc([N+](=O)[O-])cc(S(=O)(=O)[O-])c1

nearest known ligand 0.46

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 4/20 0.46
HSD17B10 Q99714 1/20 0.46
KMT2A Q03164 5/20 0.42
MEN1 O00255 2/20 0.42
TSHR P16473 2/20 0.42
RAB9A P51151 2/20 0.41
HSP90AA1 P07900 2/20 0.41
CXCR5 P32302 1/20 0.41
APLNR P35414 1/20 0.41
CCR6 P51684 1/20 0.41
GFER P55789 1/20 0.41
BCHE P06276 1/20 0.40
TLR9 Q9NR96 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C19 P33261 1/20 0.40
PKM P14618 1/20 0.40
GAA P10253 1/20 0.39
HTT P42858 1/20 0.39
ALDH1A1 P00352 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Toliodium SCHEMBL5405412 0.88 ACHE (0.58) ACHEHSD17B10KMT2AMEN1RAB9A
Toliodium SCHEMBL5406939 0.87 KMT2A (0.54) ACHEKMT2AMEN1TSHRCYP1A2
SCHEMBL5422143 0.84 KMT2A (0.45) ACHEKMT2AMEN1TSHRGAA
SCHEMBL5409182 0.84 CYP19A1 (0.37) ACHEKMT2AMEN1RAB9AGAA
SCHEMBL5406930 0.84 HSD11B1 (0.42) ACHEKMT2AMEN1RAB9AGAA
SCHEMBL5412307 0.84 HTT (0.41) ACHEKMT2AMEN1BCHEGAA
SCHEMBL2895554 0.82 ACHE (0.51) ACHEHSD17B10KMT2AMEN1RAB9A
SCHEMBL5415032 0.82 CA2 (0.42) KMT2AMEN1TSHRGAAHTT
Toliodium SCHEMBL2895871 0.80 GAA (0.50) ACHETLR9CYP1A2CYP3A4CYP2C19
SCHEMBL5400380 0.80 HSD11B1 (0.35) ACHEKMT2AMEN1RAB9AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed